Ultra Low-Temperature Growth of High-Integrity Thin Gate Oxide Films by Low-Energy Ion-Assisted Oxidation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-02-28
著者
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Kawai Yasuaki
Department Of Physiology Faculty Of Medicine Tottori University
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Kawai Yasuaki
Department Of Electronics Faculty Of Engineering Tohoku University
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Ohmi Tadahiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Ohmi Tadahiro
Department Of Electronics Faculty Of Engineering Tohoku University
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Watanabe Jinzo
Department of Electronics, Faculty of Engineering, Tohoku University
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Konishi Nobuhiro
Department of Electronics, Faculty of Engineering, Tohoku University
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Ohmi Tadahiro
Department Of Electronic Engineering
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Watanabe Jinzo
Department Of Electronics Faculty Of Engineering Tohoku University
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Konishi Nobuhiro
Department Of Electronics Faculty Of Engineering Tohoku University
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