High-Sensitivity and High-Resolution Contact Hole Patterning by Enhanced-Wettability Developer

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概要

• 論文の詳細を見る

• We have determined that high-sensitivity and high-resolution contact hole photoresist patterning can be achieved using an optimized combination of developer, added surfactant and ammonium chloride salt. The addition of surfactant improves the wettability of the developer to promote resist dissolution. The presence of ammonium chloride salt protects the sidewall of the contact hole resist pattern to achieve good pattern profile. The optimal developer can form contact hole patterns smaller than the illumination wavelength of the stepper without the use of phase shifting technology.

• 社団法人応用物理学会の論文
• 1993-01-30

著者

• Shimomura S

  Graduate School Of Science And Engineering Ehime University

• Shimomura Satoshi

  Department Of Physical Science Graduate School Of Engineering Science Osaka University

• Ohmi Tadahiro

  Department Of Electronic Engineering

• Hirose Kenji

  Nec Research Institute

• SHIMADA Hisayuki

  Department of Electronics, Faculty of Engineering, Tohoku University

• SHIMOMURA Shigeki

  Department of Electronics, Faculty of Engineering, Tohoku University

• HIROSE Kouichi

  Department of Electronics, Faculty of Engineering, Tohoku University

• Hirose K

  Nec Corp. Kanagawa Jpn

• Shimada Hisayuki

  Department Of Electronics Faculty Of Engineering Tohoku University:laboratory For Microelectronics R

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