Impact of High-Precision RF-Plasma Control on Very-Low-Temperature Silicon Epitaxy
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-04-30
著者
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Ohmi Tadahiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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HIRAYAMA Masaki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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Hirayama Masaki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Shindo Wataru
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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Ohmi Tadahiro
Department Of Electronic Engineering
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Hirayama M
Tohoku Univ. Sendai Jpn
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Shindo W
Tohoku Univ. Sendai Jpn
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Shindo Wataru
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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