Improved Transconductance and Gate Insulator Integrity of MISFETs with Si_3N_4 Gate Dielectric Fabricated by Microwave-Excited High-Density Plasma at 400℃

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概要

• 論文の詳細を見る
• 2001-09-25

著者

• Ohshima Ichiro

  Dept. Of E/e Tohoku University

• OHMI Tadahiro

  New Industry Creation Hatchery Center, Tohoku University

• NAKAO Shin-ichi

  Department of Chemical System Engineering, Faculty of Engineering, The University of Tokyo

• Nakao Shin-ichi

  Department Of Electronic Engineering Graduate School Of Engineering Tohoku University

• Nakao Shin-ichi

  Department Of Chemical Engineering Faculty Of Engineering University Of Tokyo

• HIRAYAMA Masaki

  Department of Electronic Engineering, Graduate School of Engineering, Tohoku University

• SUGAWA Shigetoshi

  Department of Electronic Engineering, Graduate School of Engineering, Tohoku University

• AHARONI Herzl

  New Industry Creation Hatchery Center, Tohoku University

• Cheng Weitao

  New Industry Creation Hatchery Center Tohoku University

• Ohshima Ichiro

  Department Of Electronic Engineering Graduate School Of Engineering Tohoku University

• HIGUCHI Masaaki

  TOSHIBA CORPORATION

• SUGAWA Sigetoshi

  Tohoku University

• HIRAYAMA Masaki

  New Industry Creation Hatchery Center, Tohoku University

• SHIMADA Hiroyuki

  New Device Development Group, SEIKO EPSON Corporation

• CHENG Weitao

  Department of Electronic Engineering, Graduate School of Engineering, Tohoku University

• ONO Yasuhiro

  New Device Development Group, SEIKO EPSON Corporation

• Sugawa Shigetoshi

  Graduate School Of Engineering Tohoku University

• Sugawa Shigetoshi

  Department Of Electronic Engineering Tohoku University

• Hirayama Masaki

  Toshiba Corporation

• Hirayama Masaki

  Department Of Electronic Engineering Faculty Of Engineering Tohoku University

• Ohmi Tadahiro

  New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University

• Aharoni Herzl

  New Industry Creation Hatchery Center Tohoku University

• Shimada Hiroyuki

  New Industry Creation Hatchery Center Tohoku University

• Nakao Shin-ichi

  Department Of Anesthesia Kyoto University Hospital

• Ono Yasuhiro

  New Device Development Group Seiko Epson Corporation

• Ohmi Tadahiro

  New Industry Creation Hatchery Center (niche) Tohoku University

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