Suppression of the low frequency noise level in (100) and (110) oriented silicon p-MOSFETs induced by an alkali-free cleaning process
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概要
- 論文の詳細を見る
This paper focuses on the suppression of the low frequency noise in p-channel MOSFETs fabricated on (110) and (100) crystallographic oriented silicon with regard to the reduction of the micro-roughness of the silicon surface induced by a newly developed alkali-free cleaning process. Because the conventional RCA cleaning makes the surface rough especially in the case of (110) orientation, we developed the 5-steps room temperature cleaning process which does not use alkaline solution. The combination of this new cleaning with the microwave-excited high-density plasma oxidation process for the fabrication of the gate oxide instead of the standard 900℃ thermal oxidation process leads to a reduction of the micro-roughness and a 2 decades drop in the 1/f noise level. Furthermore, this reduction is not only visible for (110) orientation but also for (100) in less proportion if treated in the same way.
- 社団法人電子情報通信学会の論文
- 2005-09-29
著者
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GAUBERT Philippe
New Industry Creation Hatchery Center, Tohoku University
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TERAMOTO Akinobu
New Industry Creation Hatchery Center, Tohoku University
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OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
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HAMADA Tatsufumi
Graduate School of Engineering, Tohoku University
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Teramoto Akinobu
Ulsi Laboratory Mitsubishi Electric Corporation
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Teramoto Akinobu
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Gaubert Philippe
New Industry Creation Hatchery Center Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University
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YAMAMOTO Masashi
New Industry Creation Hatchery Center, Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center Tohoku Univ.
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Yamamoto Masashi
New Industry Creation Hatchery Center Tohoku University
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Hamada Tatsufumi
Graduate School Of Engineering Tohoku University
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Teramoto Akinobu
University Of Tohoku New Industry Creation Hatchery Center (niche)
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
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