Control of nitrogen profile in radical nitridation of SiO_2 films
スポンサーリンク
概要
- 論文の詳細を見る
- 2004-09-15
著者
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TERAMOTO Akinobu
New Industry Creation Hatchery Center, Tohoku University
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OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
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KAWASE Kazumasa
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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UMEDA Hiroshi
Process Development Dept., Wafer Process Engineering Development Div., LSI Manufacturing Unit, Renes
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INOUE Masao
Process Development Dept., Wafer Process Engineering Development Div., LSI Manufacturing Unit, Renes
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TSUJIKAWA Shimpei
Process Development Dept., Wafer Process Engineering Development Div., LSI Manufacturing Unit, Renes
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AKAMATSU Yasuhiko
Process Development Dept., Wafer Process Engineering Development Div., LSI Manufacturing Unit, Renes
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Ohmi Tadahiro
Tohoku Univ. Sendai Jpn
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Teramoto Akinobu
Tohoku Univ. Sendai Jpn
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Ohmi Tadahiro
New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University
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Umeda Hiroshi
Process Development Dept. Wafer Process Engineering Development Div. Lsi Manufacturing Unit Renesas
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Teramoto Akinobu
New Industry Creation Hatchery Center Tohoku Univ.
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Tsujikawa Shimpei
Process Development Dept. Wafer Process Engineering Development Div. Lsi Manufacturing Unit Renesas
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Akamatsu Yasuhiko
Process Development Dept. Wafer Process Engineering Development Div. Lsi Manufacturing Unit Renesas
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Kawase Kazumasa
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Inoue Masao
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
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Inoue Masao
Process Development Dept. Wafer Process Engineering Development Div. Lsi Manufacturing Unit Renesas
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
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Inoue Masao
Process Development Department, Process Technology Development Division, Production and Technology Unit, RENESAS Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Umeda Hiroshi
Process Development Department, Process Technology Development Division, Production and Technology Unit, RENESAS Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Akamatsu Yasuhiko
Process Development Department, Wafer Process Engineering Development Division, LSI Manufacturing Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Tsujikawa Shimpei
Process Development Department, Process Technology Development Division, Production and Technology Unit, RENESAS Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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