PVD Tantalum Oxide with Buffer Silicon Nitride Stacked High-k MIS Structure Using Low Temperature and High Density Plasma Processing

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概要

• 論文の詳細を見る
• 2001-09-25

著者

• SHIMADA Hiroyuki

  Department of Ophthalmology, School of Medicine, Nihon University

• Ohshima Ichiro

  Dept. Of E/e Tohoku University

• OHMI Tadahiro

  New Industry Creation Hatchery Center, Tohoku University

• NAKAO Shin-ichi

  Department of Chemical System Engineering, Faculty of Engineering, The University of Tokyo

• Nakao Shin-ichi

  Department Of Electronic Engineering Graduate School Of Engineering Tohoku University

• Nakao Shin-ichi

  Department Of Chemical Engineering Faculty Of Engineering University Of Tokyo

• Ohshima Ichiro

  Department Of Electronic Engineering Graduate School Of Engineering Tohoku University

• NAKAGAWA Munekatsu

  Department of Electronic Engineering, Graduate School of Engineering, Tohoku University

• Ohmi Tadahiro

  New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University

• Shimada Hiroyuki

  New Industry Creation Hatchery Center Tohoku University

• Shimada Hiroyuki

  Department Of Geriatrics And Neurology Osaka City University Graduate School Of Medicine

• Nakao Shin-ichi

  Department Of Anesthesia Kyoto University Hospital

• Nakagawa Munekatsu

  Department Of Electronic Engineering Graduate School Of Engineering Tohoku University

• Ohmi Tadahiro

  New Industry Creation Hatchery Center (niche) Tohoku University

• SHIMADA Hiroyuki

  Department of Clinical Pathology, Tokyo Metropolitan Institute of Gerontology

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