Low Contact Resistance with Low Schottky Barrier for N-type Silicon Using Yttrium Silicide

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概要

• 論文の詳細を見る
• 2007-09-19

著者

• TERAMOTO Akinobu

  New Industry Creation Hatchery Center, Tohoku University

• TANAKA Hiroaki

  New Industry Creation Hatchery Center, Tohoku University

• SUGAWA Shigetoshi

  Graduate School of Engineering, Tohoku University

• OHMI Tadahiro

  New Industry Creation Hatchery Center, Tohoku University

• Teramoto A

  New Industry Creation Hatchery Center Tohoku University

• Tanaka Hiroaki

  New Industry Creation Hatchery Center Tohoku University

• Sugawa S

  Graduate School Of Engineering Tohoku University

• Ohmi T

  Tohoku Univ. Sendai‐shi Jpn

• SUGAWA Sigetoshi

  Tohoku University

• TANAKA Hiroaki

  Graduate School of Engineering, Tohoku University

• Goto Tetsuya

  New Industry Creation Hatchery Center Tohoku University

• ISOGAI Tatsunori

  Graduate School of Engineering, Tohoku University

• Teramoto Akinobu

  New Industry Creation Hatchery Center Tohoku University

• Teramoto Akinobu

  Department Of Electronic Engineering Faculty Of Engineering Tohoku University

• Sugawa Shigetoshi

  Graduate School Of Engineering Tohoku University

• Sugawa Shigetoshi

  Department Of Electronic Engineering Tohoku University

• Ohmi Tadahiro

  New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University

• Teramoto Akinobu

  New Industry Creation Hatchery Center Tohoku Univ.

• Isogai Tatsunori

  Graduate School Of Engineering Tohoku University

• Teramoto Akinobu

  University Of Tohoku New Industry Creation Hatchery Center (niche)

• Tanaka Hiroaki

  Graduate School Of Engineering The University Of Tokyo

• Ohmi Tadahiro

  New Industry Creation Hatchery Center (niche) Tohoku University

• Teramoto Akinobu

  New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan

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