Teramoto Akinobu | University Of Tohoku New Industry Creation Hatchery Center (niche)
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概要
関連著者
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Teramoto Akinobu
University Of Tohoku New Industry Creation Hatchery Center (niche)
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Teramoto Akinobu
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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TERAMOTO Akinobu
New Industry Creation Hatchery Center, Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center Tohoku University
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OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center Tohoku Univ.
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
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Ohmi T
Tohoku Univ. Sendai‐shi Jpn
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Teramoto A
New Industry Creation Hatchery Center Tohoku University
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Sugawa S
Graduate School Of Engineering Tohoku University
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SUGAWA Sigetoshi
Tohoku University
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Sugawa Shigetoshi
Graduate School Of Engineering Tohoku University
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Sugawa Shigetoshi
Department Of Electronic Engineering Tohoku University
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大見 忠弘
東北大学
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Ohmi Tadahiro
Department Of Electronic Engineering Tohoku University
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Ohmi Tadahiro
The New Industry Creation Hatchery Center (niche) Tohoku University
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SUGAWA Shigetoshi
Graduate School of Engineering, Tohoku University
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寺本 章伸
東北大学未来科学技術共同研究センター
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大見 忠弘
東北大学未来科学技術共同研究センター
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大見 忠弘
東北大学未来科学技術共同研究センター:東北大学wpiリサーチセンター
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HIGUCHI Masaaki
TOSHIBA CORPORATION
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Teramoto Akinobu
Tohoku Univ. Sendai Jpn
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Hirayama Masaki
Toshiba Corporation
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KURODA Rihito
Graduate School of Engineering, Tohoku University
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Kuroda Rihito
Graduate School Of Engineering Tohoku University
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SUWA Tomoyuki
New Industry Creation Hatchery Center, Tohoku University
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Suwa Tomoyuki
New Industry Creation Hatchery Center Tohoku University
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Ohmi Tadahiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University:(present Addre
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HIRAYAMA Masaki
New Industry Creation Hatchery Center, Tohoku University
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Hirayama Masaki
New Industry Creation Hatchery Center Tohoku University
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大見 忠弘
東北大学 未来科学技術共同研究センター
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IMAI Hiroshi
Graduate School of Science and Engineering, Kagoshima University
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MORITA Mizuho
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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Ohmi Tadahiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Morita M
Department Of Electronics Tohoku University
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Morita Mizuho
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Hattori Tetsuya
Depaetment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Morita M
Advanced Materials & Technology Research Laboratories Nippon Steel Corporation
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Goto Tetsuya
New Industry Creation Hatchery Center Tohoku University
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TERAMOTO Akinobu
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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Hattori Takashi
Central Research Laboratory Hitachi Ltd.
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KONDA Masahiro
New Industry Creation Hatchery Center, Tohoku University
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Watabe Shunichi
Graduate School of Engineering, Tohoku University
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Ohmi Tadahiro
Department Of Electronic Engineering
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Konda Masahiro
New Industry Creation Hatchery Center Tohoku University
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Hattori Takeo
Faculty Of Engineering Musashi Institute Of Technology
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Teramoto Akinobu
Department Of Electronics Tohoku University
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Imai Hiroshi
Graduate School Of Engineering Tohoku University
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Watabe Shunichi
Graduate School Of Engineering Tohoku University
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野平 博司
Musashi Institute Of Technology
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TANAKA Hiroaki
New Industry Creation Hatchery Center, Tohoku University
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IKENAGA Eiji
Japan Synchrotron Radiation Research Institute/SPring-8
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Tanaka Hiroaki
New Industry Creation Hatchery Center Tohoku University
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Ikenaga Eiji
Japan Synchrotron Radiation Research Institute
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Konda Masahiro
NICHe, Tohoku University
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Teramoto Akinobu
NICHe, Tohoku University
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Suwa Tomoyuki
NICHe, Tohoku University
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Ohmi Tadahiro
NICHe, Tohoku University
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MAKIHARA Koji
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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ARATANI Takashi
Shin-Etsu Chemical Co., Ltd.
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USHIO Jiro
Hitachi, Ltd.
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NOHIRA Hiroshi
Musashi Institute of Technology
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HATTORI Takeo
New Industry Creation Hatchery Center, Tohoku University
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ISOGAI Tatsunori
Graduate School of Engineering, Tohoku University
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Abe Kenichi
Graduate School of Engineering, Tohoku University
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Fujisawa Takafumi
Graduate School of Engineering, Tohoku University
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Sugimura Masahiko
Research and Development Center, Zeon Corporation
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Kawasaki Masafumi
Research and Development Center, Zeon Corporation
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INOKUCHI Atsutoshi
New Industry Creation Hatchery Center, Tohoku University
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Teramoto Akinobu
Ulsi Laboratory Mitsubishi Electric Corporation
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Inokuchi Atsutoshi
New Industry Creation Hatchery Center Tohoku University
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Sugimura Masahiko
Research And Development Center Zeon Corporation
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Nohira Hiroshi
Faculty Of Engineering Musashi Institute Of Technology
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Hattori T
New Industry Creation Hatchery Center Tohoku University
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Ushio Jiro
Hitachi Ltd.
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Makihara K
Department Of Electronics Tohoku University
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Makihara Koji
Department Of Applied Chemistry Graduate School Of Engineering Kyushu University
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Nakazawa Hiroshi
New Industry Creation Hatchery Center Tohoku University
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Takahashi Ichirou
Graduate School Of Engineering Tohoku University
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Abe Kenichi
Graduate School Of Engineering Tohoku University
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Aratani Takashi
Shin-etsu Chemical Co. Ltd.
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Isogai Tatsunori
Graduate School Of Engineering Tohoku University
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Kawasaki Masafumi
Research And Development Center Zeon Corporation
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Fujisawa Takafumi
Graduate School Of Engineering Tohoku University
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Sugimura Masahiko
Research & Development Center, Zeon Corp., 1-2-1 Yako, Kawasaki-ku, Kawasaki 210-9507, Japan
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GAUBERT Philippe
New Industry Creation Hatchery Center, Tohoku University
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NAKANO Yukihisa
Graduate School of Engineering, Tohoku University
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OGAWA Hiroki
Department of Surgery, Otsu Red Cross Hospital
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Tanaka Yoshitsugu
Tokyo Electron Ltd. Tokyo Jpn
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Hattori Takeo
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Tye Ching
Graduate School Of Engineering Tohoku University
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CHENG Weitao
New Industry Creation Hatchery Center, Tohoku University
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SUGAWA Shigetoshi
New Industry Creation Hatchery Center, Tohoku University
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Cheng Weitao
New Industry Creation Hatchery Center Tohoku University
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MORIKI Kazunori
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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NAKAMURA Kou
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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KWON Myoung
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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HAMADA Tatsufumi
Graduate School of Engineering, Tohoku University
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Akasaka Yasushi
Tokyo Electron Ltd. Tokyo Jpn
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TANAKA Hiroaki
Graduate School of Engineering, Tohoku University
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Kwon Myoung
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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HASEGAWA Eiji
Department of Electronics, Faculty of Engineering, Tohoku University
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MURAKAWA Shigemi
Tokyo Electron Ltd.
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TAKEUCHI Masashi
Tokyo Electron AT Ltd.
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HONDA Minoru
Tokyo Electron AT Ltd.
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ISHIZUKA Shu-ichi
Tokyo Electron AT Ltd.
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NAKANISHII Toshio
Tokyo Electron AT Ltd.
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HIROTA Yoshihiro
Tokyo Electron AT Ltd.
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SUGAWARA Takuya
Tokyo Electron Ltd.
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SUGAWA Shigetoshi
Tokyo Electron AT Ltd.
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Ishii Hidekazu
University Of Tohoku New Industry Creation Hatchery Center (niche)
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Nakano Yukihisa
Graduate School Of Engineering Tohoku University
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ISHIKAWA Hiraku
TOKYO ELECTRON LTD.
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NOZAWA Toshihisa
TOKYO ELECTRON LTD.
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MATSUOKA Takaaki
TOKYO ELECTRON LTD.
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ITO Takashi
Graduate School of Engineering, Tohoku University
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ITOH Azumi
New Industry Creation Hatchery Center, Tohoku University
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YASUDA Seiji
New Industry Creation Hatchery Center, Tohoku University
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Terasaki Masato
Tokyo Electron Ltd.
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Ogawa Hiroki
Department Of Material Science School Of Engineering University Of Tokyo
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Gaubert Philippe
New Industry Creation Hatchery Center Tohoku University
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Nakanishi Toshio
Tokyo Electron At Ltd. Hyogo Jpn
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ASAHARA Hirokazu
New Industry Creation Hatchery Center, Tohoku University
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WATANUKI Kohei
New Industry Creation Hatchery Center, Tohoku University
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Hasegawa E
Nec Corp. Kanagawa Jpn
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Hasegawa Eiji
Department Of Electronics Faculty Of Engineering Tohoku University
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Hattori Takeo
Department Of Electrical & Electronic Engineering Musashi Institute Of Technology
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Tanahashi Naoki
University Of Tohoku New Industry Creation Hatchery Center (niche)
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Kitano M
Shimane Univ. Matsue Jpn
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Moriki Kazunori
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
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Kato Takeyoshi
University Of Tohoku New Industry Creation Hatchery Center (niche)
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TAKAHASHI Ichirou
New Industry Creation Hatchery Center, Tohoku University
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HIDAKA Atsushi
University of Tohoku, Department of Electronic Engineering, Graduate School of Engineering
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YAMASHITA Satoru
University of Tohoku, New Industry Creation Hatchery Center (NICHe)
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KITANO Masafumi
University of Tohoku, New Industry Creation Hatchery Center (NICHe)
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GOTO Tetsuya
University of Tohoku, New Industry Creation Hatchery Center (NICHe)
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TERAMOTO Akinobu
University of Tohoku, New Industry Creation Hatchery Center (NICHe)
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SHIRAI Yasuyuki
University of Tohoku, New Industry Creation Hatchery Center (NICHe)
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OHMI Tadahiro
University of Tohoku, New Industry Creation Hatchery Center (NICHe)
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ISOGAI Tatsunori
New Industry Creation Hatchery Center, Tohoku University
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YAMAMOTO Masashi
New Industry Creation Hatchery Center, Tohoku University
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TERADA Naozumi
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Hidaka Atsushi
University Of Tohoku Department Of Electronic Engineering Graduate School Of Engineering
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Yasuda Seiji
New Industry Creation Hatchery Center Tohoku University
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Watanuki Kohei
New Industry Creation Hatchery Center Tohoku University
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Akasaka Yasushi
Tokyo Electron Ltd.
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AZUMI Keita
New Industry Creation Hatchery Center, Tohoku University
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WATABE Syunichi
Graduate School of Engineering, Tohoku University
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Yamamoto Masashi
New Industry Creation Hatchery Center Tohoku University
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Terada Naozumi
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
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Itoh Azumi
New Industry Creation Hatchery Center Tohoku University
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Ogawa Hiroki
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
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Ogawa Hiroki
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology:(present Address) N
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Shirai Yasuyuki
New Industry Creation Hatchery Center Tohoku University
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Hamada Tatsufumi
Graduate School Of Engineering Tohoku University
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Asahara Hirokazu
New Industry Creation Hatchery Center Tohoku University
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Yamashita Satoru
New Industry Creation Hatchery Center Tohoku University
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Azumi Keita
New Industry Creation Hatchery Center Tohoku University
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Tanaka Hiroaki
Graduate School Of Engineering The University Of Tokyo
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Ohmi Tadahiro
University Of Tohoku New Industry Creation Hatchery Center (niche)
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Tanaka Yoshitsugu
Tokyo Electron Ltd.
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Nakao Yukihisa
Graduate School of Engineering, Tohoku University
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Sugawara Takuya
Tokyo Electron AT Ltd., Technology Development Center, 650, Hosaka-cho Mitsuzawa, Nirasaki, Yamanashi 407-0192, Japan
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Ogawa Hiroki
Department of Chemistry, School of Science and Engineering, Waseda University
著作論文
- High Current Drivability FD-SOI CMOS with Low Source/Drain Series Resistance(Session 9B : Nano-Scale devices and Physics)
- Impact of fully depleted silicon-on-insulator accumulation-mode CMOS on Si(110) (シリコン材料・デバイス)
- The data analysis technique of the atomic force microscopy for the atomically flat silicon surface(Session9A: Silicon Devices IV)
- The data analysis technique of the atomic force microscopy for the atomically flat silicon surface(Session9A: Silicon Devices IV)
- Performance Comparison of Ultra-thin FD-SOI Inversion-, Intrinsic- and Accumulation-Mode MOSFETs
- Study on Compositional Transition Layers at Gate Dielectrics/Si Interface by using Angle-resolved X-ray Photoelectron Spectroscopy
- Study on Compositional Transition Layers at Gate Dielectrics/Si Interface by using Angle-resolved X-ray Photoelectron Spectroscopy
- Preoxide-Controlled Oxidation for Very Thin Oxide Films
- Native Oxide Growth on Silicon Surface in Ultrapure Water and Hydrogen Peroxide
- Nitrogen Profile Study for SiON Gate Dielectrics of Advanced DRAM
- Data Analysis Technique of Atomic Force Microscopy for Atomically Flat Silicon Surfaces
- Low Contact Resistance with Low Schottky Barrier for N-type Silicon Using Yttrium Silicide
- A Statistical Analysis of Distributions of RTS Characteristics by Wide-Range Sampling Frequencies
- A Statistical Analysis of Distributions of RTS Characteristics by Wide-Range Sampling Frequencies
- A Material of Semiconductor Package with Low Dielectric Constant, Low Dielectric Loss and Flat Surface for High Frequency and Low Power Propagation(Session2: Silicon Devices I)
- A Material of Semiconductor Package with Low Dielectric Constant, Low Dielectric Loss and Flat Surface for High Frequency and Low Power Propagation(Session2: Silicon Devices I)
- The Evaluation of New Amorphous Hydrocarbon Film aCHx, for Copper Barrier Dielectric Film in Low-k Copper Metallization
- Low Dielectric Constant Non-Porous Fluorocarbon Films for Inter-Layer Dielectric
- Characterization of Zinc Oxide Films Grown by a Newly Developed Plasma Enhanced MOCVD Employing Microwave Excited High Density Plasma
- Adsorption Behavior of Various Fluorocarbon Gases on Silicon Wafer Surface
- Suppression of the low frequency noise level in (100) and (110) oriented silicon p-MOSFETs induced by an alkali-free cleaning process
- Effect of Silicon Wafer In Situ Cleaning on the Chemical Structure of Ultrathin Silicon Oxide Film
- Technology of Ferroelectric Thin Film Formation with Large Coercive Field for Future Scaling Down of Ferroelectric Gate FET Memory Device
- A New Statistical Evaluation Method for the Variation of MOSFETs
- Low Leakage Current and Low Resistivity p^+n Diodes on Si(110) Fabricated by Ga^+/B^+ Combination I/I and Low Temperature Annealing