Azumi Keita | New Industry Creation Hatchery Center Tohoku University
スポンサーリンク
概要
関連著者
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Sugawa Shigetoshi
Graduate School Of Engineering Tohoku University
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Hirayama Masaki
New Industry Creation Hatchery Center Tohoku University
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TAKAHASHI Ichirou
New Industry Creation Hatchery Center, Tohoku University
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Azumi Keita
New Industry Creation Hatchery Center Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
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TERAMOTO Akinobu
New Industry Creation Hatchery Center, Tohoku University
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Sugawa S
Graduate School Of Engineering Tohoku University
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HIGUCHI Masaaki
TOSHIBA CORPORATION
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SUGAWA Sigetoshi
Tohoku University
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HIRAYAMA Masaki
New Industry Creation Hatchery Center, Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center Tohoku University
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Sugawa Shigetoshi
Department Of Electronic Engineering Tohoku University
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Hirayama Masaki
Toshiba Corporation
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Ohmi Tadahiro
New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University
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Funaiwa Kiyoshi
New Industry Creation Hatchery Center Tohoku University
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Takahashi Ichirou
Graduate School Of Engineering Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center Tohoku Univ.
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AZUMI Keita
New Industry Creation Hatchery Center, Tohoku University
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Shirai Yasuyuki
New Industry Creation Hatchery Center (niche) Tohoku University
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Yamashita Satoru
New Industry Creation Hatchery Center Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Azumi Keita
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Sugawa Shigetoshi
Graduate School of Engineering, Tohoku University, 6-6-11 Aza Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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SUGAWA Shigetoshi
Graduate School of Engineering, Tohoku University
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OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
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ISOGAI Tatsunori
Graduate School of Engineering, Tohoku University
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Teramoto Akinobu
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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FUNAIWA Kiyoshi
New Industry Creation Hatchery Center, Tohoku University
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SHIRAI Yasuyuki
New Industry Creation Hatchery Center, University of Tohoku
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ISOGAI Tatsunori
New Industry Creation Hatchery Center, Tohoku University
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YAMASHITA Satoru
New Industry Creation Hatchery Center, Tohoku University
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Shirai Yasuyuki
New Industry Creation Hatchery Center Tohoku University
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Isogai Tatsunori
Graduate School Of Engineering Tohoku University
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Teramoto Akinobu
University Of Tohoku New Industry Creation Hatchery Center (niche)
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Teramoto Akinobu
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Hirayama Masaki
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Takahashi Ichirou
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Yamashita Satoru
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Shirai Yasuyuki
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Funaiwa Kiyoshi
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
著作論文
- Technology of Ferroelectric Thin Film Formation with Large Coercive Field for Future Scaling Down of Ferroelectric Gate FET Memory Device
- Formation of Ferroelectric Sr_2(Ta_,Nb_x)_2O_7 Thin Film on Amorphous SiO_2 by Microwave-Excited Plasma Enhanced Metalorganic Chemical Vapor Deposition
- Development of Microwave-Excited Plasma-Enhanced Metal–Organic Chemical Vapor Deposition System for Forming Ferroelectric Sr2(Ta1-x,Nbx)2O7 Thin Film on Amorphous SiO2
- Fabrication of Pt/Sr2(Ta1-x,Nbx)2O7/IrO2/SiO2/Si Device with Large Memory Window and Metal–Ferroelectric–Metal–Insulator–Si Field-Effect Transistor