Adsorption Behavior of Various Fluorocarbon Gases on Silicon Wafer Surface

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-04-30

著者

• Goto Tetsuya

  New Industry Creation Hatchery Center Tohoku University

• Ishii Hidekazu

  University Of Tohoku New Industry Creation Hatchery Center (niche)

• Tanahashi Naoki

  University Of Tohoku New Industry Creation Hatchery Center (niche)

• Kitano M

  Shimane Univ. Matsue Jpn

• Kato Takeyoshi

  University Of Tohoku New Industry Creation Hatchery Center (niche)

• HIDAKA Atsushi

  University of Tohoku, Department of Electronic Engineering, Graduate School of Engineering

• YAMASHITA Satoru

  University of Tohoku, New Industry Creation Hatchery Center (NICHe)

• KITANO Masafumi

  University of Tohoku, New Industry Creation Hatchery Center (NICHe)

• GOTO Tetsuya

  University of Tohoku, New Industry Creation Hatchery Center (NICHe)

• TERAMOTO Akinobu

  University of Tohoku, New Industry Creation Hatchery Center (NICHe)

• SHIRAI Yasuyuki

  University of Tohoku, New Industry Creation Hatchery Center (NICHe)

• OHMI Tadahiro

  University of Tohoku, New Industry Creation Hatchery Center (NICHe)

• Hidaka Atsushi

  University Of Tohoku Department Of Electronic Engineering Graduate School Of Engineering

• Shirai Yasuyuki

  New Industry Creation Hatchery Center Tohoku University

• Teramoto Akinobu

  Department Of Electronics Tohoku University

• Yamashita Satoru

  New Industry Creation Hatchery Center Tohoku University

• Teramoto Akinobu

  University Of Tohoku New Industry Creation Hatchery Center (niche)

• Ohmi Tadahiro

  University Of Tohoku New Industry Creation Hatchery Center (niche)

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