Ferroelectric Sr_2(Ta_<1-x>, Nb_x)_2O_7 with a Low Dielectric Constant by Plasma Physical Vapor Deposition and Oxygen Radical Treatment
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-04-30
著者
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TERAMOTO Akinobu
New Industry Creation Hatchery Center, Tohoku University
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OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center Tohoku University
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SUGAWA Shigetoshi
Management of Science and Technology Department Graduate School of Engineering, Tohoku University
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HIRAYAMA Masaki
New Industry Creation Hatchery Center, Tohoku University
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Goto Tetsuya
New Industry Creation Hatchery Center Tohoku University
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TAKAHASHI Ichirou
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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SAKURAI Hiroyuki
Specialty Products Division, UBE INDUSTRIES, LTD.
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YAMADA Atsuhiko
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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FUNAIWA Kiyoshi
New Industry Creation Hatchery Center, Tohoku University
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HIRAI Kentaro
New Industry Creation Hatchery Center, Tohoku University
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URABE Shinichi
New Industry Creation Hatchery Center, Tohoku University
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