High-Quality Silicon Oxide Film Formed by Diffusion Region Plasma Enhanced Chemical Vapor Deposition and Oxygen Radical Treatment Using Microwave-Excited High-Density Plasma
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-04-30
著者
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TERAMOTO Akinobu
New Industry Creation Hatchery Center, Tohoku University
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SUGAWA Shigetoshi
Graduate School of Engineering, Tohoku University
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OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
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Sugawa S
Graduate School Of Engineering Tohoku University
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Ohmi T
New Industry Creation Hatchery Center Tohoku University
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HIRAYAMA Masaki
New Industry Creation Hatchery Center, Tohoku University
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TANAKA Hiroaki
Graduate School of Engineering, Tohoku University
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CHUANJIE Zhong
New Industry Creation Hatchery Center, Tohoku University
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HAYAKAWA Yukio
New Industry Creation Hatchery Center, Tohoku University
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Teramoto Akinobu
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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