Low Resistivity PVD TaNx/Ta/TaNx Stacked Metal Gate CMOS Technology Using Self-Grown bcc-Phased Tantalum on TaNx Buffer Layer

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概要

• 論文の詳細を見る
• 2000-08-28

著者

• Ohshima Ichiro

  Dept. Of E/e Tohoku University

• OHMI Tadahiro

  New Industry Creation Hatchery Center, Tohoku University

• SUGAWA Shigetoshi

  Department of Electronic Engineering, Graduate School of Engineering, Tohoku University

• Ohshima Ichiro

  Department Of Electronic Engineering Graduate School Of Engineering Tohoku University

• USHIKI Takeo

  New Industry Creation Hatchery Center, Tohoku University

• SUGAWA Sigetoshi

  Tohoku University

• SHIMADA Hiroyuki

  New Device Development Group, SEIKO EPSON Corporation

• Sugawa Shigetoshi

  Graduate School Of Engineering Tohoku University

• Sugawa Shigetoshi

  Department Of Electronic Engineering Tohoku University

• Ohmi Tadahiro

  New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University

• Ushiki Takeo

  New Industry Creation Hatchery Center Tohoku University

• Shimada Hiroyuki

  New Industry Creation Hatchery Center Tohoku University

• Ohmi Tadahiro

  New Industry Creation Hatchery Center (niche) Tohoku University

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