SUGAWA Shigetoshi | Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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概要
- Sugawa Shigetoshiの詳細を見る
- 同名の論文著者
- Department of Electronic Engineering, Graduate School of Engineering, Tohoku Universityの論文著者
関連著者
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OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
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SUGAWA Shigetoshi
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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SUGAWA Sigetoshi
Tohoku University
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Sugawa Shigetoshi
Graduate School Of Engineering Tohoku University
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Sugawa Shigetoshi
Department Of Electronic Engineering Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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Aharoni Herzl
New Industry Creation Hatchery Center Tohoku University
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AHARONI Herzl
New Industry Creation Hatchery Center, Tohoku University
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HIGUCHI Masaaki
TOSHIBA CORPORATION
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HIRAYAMA Masaki
New Industry Creation Hatchery Center, Tohoku University
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Hirayama Masaki
Toshiba Corporation
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Saito Yuji
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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HIRAYAMA Masaki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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Saito Y
Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University
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Hirayama Masaki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Saito Yuji
Department Of Anesthesiology Gunma Prefectural Cardiovascular Center
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大川 猛
(独)産業技術総合研究所情報技術研究部門
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斎藤 弥八
名大院工
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斎藤 弥八
名大工
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Ohshima Ichiro
Dept. Of E/e Tohoku University
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Kotani Koji
Graduate School Of Engineering Tohoku University
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Kotani Koji
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Saito Yahachi
Institute For Materials Research (imr) Tohoku University
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Saito Yahachi
Department Of Applied Physics Faculty Of Engineering Nagoya Universtiy
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大川 猛
東北大学大学院工学研究科
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大川 猛
National Institute For Advanced Industrial Science And Technology (aist):information Technology Rese
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Ohkawa Takeshi
Department Of Electronic Engineering Tohoku University
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OHTSUBO Kazuo
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
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Ohshima Ichiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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SHIMADA Hiroyuki
New Device Development Group, SEIKO EPSON Corporation
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Ohtsubo Kazuo
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Kobayashi Sadao
Taisei Corporation
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大川 猛
National Institute For Advanced Industrial Science And Technology (aist) Information Technology Rese
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Shimada Hiroyuki
New Industry Creation Hatchery Center Tohoku University
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WAKAYAMA Yoshihide
Department of Electronic Engineering, Tohoku University
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大川 猛
(株)トプスシステムズ
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Wakayama Yoshihide
Department Of Electronic Engineering Tohoku University
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大川 猛
宇都宮大学大学院工学研究科情報システム科学専攻
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NAKAMURA Osamu
Department of Radiological Technology, Faculty of Health Sciences, Nihon Institute of Medical Scienc
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AHARONI Herzl
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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NAKAO Shin-ichi
Department of Chemical System Engineering, Faculty of Engineering, The University of Tokyo
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Nakao Shin-ichi
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Nakao Shin-ichi
Department Of Chemical Engineering Faculty Of Engineering University Of Tokyo
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CHIBA Koji
Department of Gastroenterology and Hematology, Hokkaido University Graduate School of Medicine
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UEDA Naoki
Process Development Laboratory, Sharp Corporation
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YAMAUCHI Yoshimitsu
Process Development Laboratory, Sharp Corporation
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SEKINE Katsuyuki
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
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HIRAMAYA Masaki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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Cheng Weitao
New Industry Creation Hatchery Center Tohoku University
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USHIKI Takeo
New Industry Creation Hatchery Center, Tohoku University
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CHENG Weitao
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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ONO Yasuhiro
New Device Development Group, SEIKO EPSON Corporation
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TATE Tomoyasu
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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MORIMOTO Akihiro
Department of Electronic Engineering, Tohoku University
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Ueda Naoki
Process Development Laboratory Sharp Corporation
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Chiba Koji
Graduate School Of Engineering Tohoku University
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Ushiki Takeo
New Industry Creation Hatchery Center Tohoku University
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Yamauchi Yoshimitsu
Process Development Laboratory Sharp Corporation
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Nakao Shin-ichi
Department Of Anesthesia Kyoto University Hospital
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Sekine K
Japan Aviation Electronics Ind. Ltd. Tokyo Jpn
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Sekine Katsuyuki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Nakamura Osamu
Department Of Radiological Technology Faculty Of Health Sciences Nihon Institute Of Medical Science
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Ono Yasuhiro
New Device Development Group Seiko Epson Corporation
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Nakamura Osamu
Department Of Applied Physics Osaka University
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Nakamura Osamu
Department Of Electronics Engineering Graduate School Of Engineering Tohoku University
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Aharoni Herzl
Department of Electrical and Computer Engineering, Ben Gurion University of the Negev, Beer-Sheva 84105, Israel
著作論文
- Highly Reliable MOS Trench Gate FET by Oxygen Radical Oxidation
- Improved J-E Characteristics and Stress Induced Leakage Currents (SILC) in Oxynitride Films Grown at 400℃ by Microwave-Excited High-Density Kr/O_2/NH_3 Plasma
- Ultra-Thin Silicon Oxynitride Film Grown at Low-Temperature by Microwave-Excited High-Density Kr/O_2/N_2 Plasma
- Improved Transconductance and Gate Insulator Integrity of MISFETs with Si_3N_4 Gate Dielectric Fabricated by Microwave-Excited High-Density Plasma at 400℃
- Low Resistivity PVD TaNx/Ta/TaNx Stacked Metal Gate CMOS Technology Using Self-Grown bcc-Phased Tantalum on TaNx Buffer Layer
- A High S/N Ratio Object Extraction CMOS Image Sensor with Column Parallel Signal Processing
- Interconnect and Substrate Structure for Gigascale Integration
- The Effect of Organic Contaminations Molecular Weights in the Cleanroom Air on MOS Devices Degradation - a Controlled laminar Air Flow Experiment
- The Effect of Organic Compounds Contamination on the Electrical Characteristics of Ultra-Thin Gate Oxide Films