Sekine K | Japan Aviation Electronics Ind. Ltd. Tokyo Jpn
スポンサーリンク
概要
関連著者
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Saito Yuji
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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SEKINE Katsuyuki
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
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Saito Yuji
Department Of Anesthesiology Gunma Prefectural Cardiovascular Center
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Sekine K
Japan Aviation Electronics Ind. Ltd. Tokyo Jpn
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Sekine Katsuyuki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
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HIGUCHI Masaaki
TOSHIBA CORPORATION
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HIRAYAMA Masaki
New Industry Creation Hatchery Center, Tohoku University
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Hirayama Masaki
Toshiba Corporation
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Ohmi Tadahiro
New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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Saito Y
Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University
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HIRAYAMA Masaki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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Hirayama Masaki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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HIRAMAYA Masaki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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Aharoni Herzl
New Industry Creation Hatchery Center Tohoku University
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斎藤 弥八
名大院工
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Ohmi Tadahiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Saito Yahachi
Department Of Applied Physics Faculty Of Engineering Nagoya Universtiy
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AHARONI Herzl
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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NAKAO Shin-ichi
Department of Chemical System Engineering, Faculty of Engineering, The University of Tokyo
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Nakao Shin-ichi
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Nakao Shin-ichi
Department Of Chemical Engineering Faculty Of Engineering University Of Tokyo
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SUGAWA Shigetoshi
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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OHTSUBO Kazuo
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
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AHARONI Herzl
New Industry Creation Hatchery Center, Tohoku University
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HAMADA Tatsufumi
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
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NANBU Tetsuhiro
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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SUGAWA Sigetoshi
Tohoku University
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Sugawa Shigetoshi
Graduate School Of Engineering Tohoku University
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Sugawa Shigetoshi
Department Of Electronic Engineering Tohoku University
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Ohmi Tadahiro
Department Of Electronic Engineering
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Ohtsubo Kazuo
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Hirayama M
Tohoku Univ. Sendai Jpn
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Nanbu Tetsuhiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Nakao Shin-ichi
Department Of Anesthesia Kyoto University Hospital
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Hamada Tatsufumi
Graduate School Of Engineering Tohoku University
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Aharoni Herzl
Department of Electrical and Computer Engineering, Ben Gurion University of the Negev, Beer-Sheva 84105, Israel
著作論文
- Low Temperature Gate Oxidation MOS Transistor Produced by Kr/O_2 Microwave Excited High-Density Plasma
- Ultra-Thin Silicon Oxynitride Film Grown at Low-Temperature by Microwave-Excited High-Density Kr/O_2/N_2 Plasma
- Ultra-Thin Silicon Oxynitride Films as Cu Diffusion Barrier for Lowering Interconnect Resistivity
- High-Integrity Silicon Oxide Grown at Low-Temperature by Atomic Oxygen Generated in High-Density Krypton Plasma
- Low-Temperature Formation of Silicon Nitride Film by Direct Nitridation Employing High-Density and Low-Energy Ion Bombardment
- Ultra-Low-Temperature Formation of Si Nitride Film by Direct Nitridation Employing High-Density and Low-Energy Ion Bombardment