Hirayama M | Tohoku Univ. Sendai Jpn
スポンサーリンク
概要
関連著者
-
Hirayama M
Tohoku Univ. Sendai Jpn
-
Ohmi Tadahiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
-
HIRAYAMA Masaki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
-
Hirayama Masaki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
-
Shindo Wataru
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
-
Ohmi Tadahiro
Department Of Electronic Engineering
-
Shindo W
Tohoku Univ. Sendai Jpn
-
Shindo Wataru
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
-
OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
-
Saito Yuji
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
-
SEKINE Katsuyuki
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
-
HIRAMAYA Masaki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
-
Saito Y
Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University
-
HIGUCHI Masaaki
TOSHIBA CORPORATION
-
HIRAYAMA Masaki
New Industry Creation Hatchery Center, Tohoku University
-
Hirayama Masaki
Toshiba Corporation
-
Ohmi Tadahiro
New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University
-
Saito Yuji
Department Of Anesthesiology Gunma Prefectural Cardiovascular Center
-
Sekine K
Japan Aviation Electronics Ind. Ltd. Tokyo Jpn
-
Sekine Katsuyuki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
-
Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
著作論文
- High-Integrity Silicon Oxide Grown at Low-Temperature by Atomic Oxygen Generated in High-Density Krypton Plasma
- Abrupt and Arbitrary Profile Formation in Silicon Using a Low-Kinetic-Energy Ion Bombardment Process
- Impact of High-Precision RF-Plasma Control on Very-Low-Temperature Silicon Epitaxy