Sekine Katsuyuki | Department Of Electronic Engineering Faculty Of Engineering Tohoku University
スポンサーリンク
概要
- SEKINE Katsuyukiの詳細を見る
- 同名の論文著者
- Department Of Electronic Engineering Faculty Of Engineering Tohoku Universityの論文著者
関連著者
-
SEKINE Katsuyuki
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
-
Sekine Katsuyuki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
-
Saito Yuji
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
-
Saito Yuji
Department Of Anesthesiology Gunma Prefectural Cardiovascular Center
-
Sekine K
Japan Aviation Electronics Ind. Ltd. Tokyo Jpn
-
OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
-
HIGUCHI Masaaki
TOSHIBA CORPORATION
-
HIRAYAMA Masaki
New Industry Creation Hatchery Center, Tohoku University
-
Hirayama Masaki
Toshiba Corporation
-
Ohmi Tadahiro
New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University
-
Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
-
Saito Y
Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University
-
HIRAYAMA Masaki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
-
Hirayama Masaki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
-
Ohmi Tadahiro
Department Of Electronic Engineering
-
Ohmi Tadahiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
-
HIRAMAYA Masaki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
-
Choi Geun-min
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
-
Aharoni Herzl
New Industry Creation Hatchery Center Tohoku University
-
森田 浩
大阪大学 大学院 情報科学研究科
-
斎藤 弥八
名大院工
-
Morita Hiroshi
Department of Cardiology, Shingu Munichipal Hospital
-
MORITA Mizuho
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
-
Ohmi Tadahiro
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
-
Saito Yahachi
Department Of Applied Physics Faculty Of Engineering Nagoya Universtiy
-
Morita Mizuho
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
-
AHARONI Herzl
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
-
NAKAO Shin-ichi
Department of Chemical System Engineering, Faculty of Engineering, The University of Tokyo
-
Nakao Shin-ichi
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
-
Nakao Shin-ichi
Department Of Chemical Engineering Faculty Of Engineering University Of Tokyo
-
SUGAWA Shigetoshi
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
-
OHTSUBO Kazuo
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
-
AHARONI Herzl
New Industry Creation Hatchery Center, Tohoku University
-
HAMADA Tatsufumi
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
-
NANBU Tetsuhiro
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
-
SUGAWA Sigetoshi
Tohoku University
-
Sugawa Shigetoshi
Graduate School Of Engineering Tohoku University
-
Sugawa Shigetoshi
Department Of Electronic Engineering Tohoku University
-
Ohtsubo Kazuo
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
-
Hirayama M
Tohoku Univ. Sendai Jpn
-
Nanbu Tetsuhiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
-
CHOI Geun-Min
Memory R & D Division, Hyundai Electronics Industries Co., LTD
-
Nakao Shin-ichi
Department Of Anesthesia Kyoto University Hospital
-
Hamada Tatsufumi
Graduate School Of Engineering Tohoku University
-
Morita Hiroshi
Department Of Applied Chemistry School Of Engineering Kanagawa University
-
Choi Geun-min
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
-
Aharoni Herzl
Department of Electrical and Computer Engineering, Ben Gurion University of the Negev, Beer-Sheva 84105, Israel
著作論文
- Low Temperature Gate Oxidation MOS Transistor Produced by Kr/O_2 Microwave Excited High-Density Plasma
- Ultra-Thin Silicon Oxynitride Film Grown at Low-Temperature by Microwave-Excited High-Density Kr/O_2/N_2 Plasma
- Ultra-Thin Silicon Oxynitride Films as Cu Diffusion Barrier for Lowering Interconnect Resistivity
- High-Integrity Silicon Oxide Grown at Low-Temperature by Atomic Oxygen Generated in High-Density Krypton Plasma
- Low-Temperature Formation of Silicon Nitride Film by Direct Nitridation Employing High-Density and Low-Energy Ion Bombardment
- Ultra-Low-Temperature Formation of Si Nitride Film by Direct Nitridation Employing High-Density and Low-Energy Ion Bombardment
- Native Oxide Growing Behavior on Si Crystal Structure and Resistivity
- Metallic Impurity Growing Behavior on Surface Crystal Structure