HAMADA Tatsufumi | Department of Electronic Engineering, Graduate school of Engineering, Tohoku University

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概要

• 同名の論文著者
• Department of Electronic Engineering, Graduate school of Engineering, Tohoku Universityの論文著者

関連著者

• HAMADA Tatsufumi

  Department of Electronic Engineering, Graduate school of Engineering, Tohoku University

• Ohmi Tadahiro

  New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University

• Hamada Tatsufumi

  Graduate School Of Engineering Tohoku University

• Ohmi Tadahiro

  New Industry Creation Hatchery Center (niche) Tohoku University

• Aharoni Herzl

  New Industry Creation Hatchery Center Tohoku University

• IMAIZUMI Fuminobu

  Department of Electronic Engineering, Graduate school of Engineering, Tohoku University

• Imaizumi Fuminobu

  Department Of Electronic Engineering Graduate School Of Engineering Tohoku University

• 斎藤 弥八

  名大院工

• OHMI Tadahiro

  New Industry Creation Hatchery Center, Tohoku University

• Saito Yahachi

  Department Of Applied Physics Faculty Of Engineering Nagoya Universtiy

• Saito Yuji

  Department Of Electronic Engineering Graduate School Of Engineering Tohoku University

• AHARONI Herzl

  New Industry Creation Hatchery Center, Tohoku University

• SEKINE Katsuyuki

  Department of Electronic Engineering, Graduate school of Engineering, Tohoku University

• Saito Y

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University

• SUGAWA Sigetoshi

  Tohoku University

• Sugawa Shigetoshi

  Graduate School Of Engineering Tohoku University

• Sugawa Shigetoshi

  Department Of Electronic Engineering Tohoku University

• Kanemoto Kei

  Department Of Electronic Engineering Graduate School Of Engineering Tohoku University

• Saito Yuji

  Department Of Anesthesiology Gunma Prefectural Cardiovascular Center

• Sekine K

  Japan Aviation Electronics Ind. Ltd. Tokyo Jpn

• Sekine Katsuyuki

  Department Of Electronic Engineering Faculty Of Engineering Tohoku University

もっと見る 閉じる

著作論文

• Low Temperature Gate Oxidation MOS Transistor Produced by Kr/O_2 Microwave Excited High-Density Plasma
• A Comparative Examination of Polyoxide Films Performance Grown by Conventional Dry Thermal (900℃) or Plasma Assisted (400℃) Oxidation Techniques
• Dopant-Induced Defects Formed by Ion Implantation : Dopant Species Dependence

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