Hamada Tatsufumi | Graduate School Of Engineering Tohoku University
スポンサーリンク
概要
関連著者
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Hamada Tatsufumi
Graduate School Of Engineering Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University
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HAMADA Tatsufumi
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
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Sugawa Shigetoshi
Graduate School Of Engineering Tohoku University
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TERAMOTO Akinobu
New Industry Creation Hatchery Center, Tohoku University
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OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
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SUGAWA Sigetoshi
Tohoku University
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NOHIRA Hiroshi
Musashi Institute of Technology
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HIGUCHI Masaaki
Graduate School of Engineering, Tohoku University
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ARATANI Takashi
Graduate School of Engineering, Tohoku University
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HAMADA Tatsufumi
Graduate School of Engineering, Tohoku University
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SHINAGAWA Seiji
Musashi Institute of Technology
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Sugawa Shigetoshi
Department Of Electronic Engineering Tohoku University
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Aharoni Herzl
New Industry Creation Hatchery Center Tohoku University
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IMAIZUMI Fuminobu
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
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Imaizumi Fuminobu
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
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Ikenaga Eiji
JASRI/Spring-8, Kouto, Mikazuki, Hyogo 679-5198, Japan
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IKENAGA Eiji
JASRI/Spring-8
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野平 博司
Musashi Institute Of Technology
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GAUBERT Philippe
New Industry Creation Hatchery Center, Tohoku University
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斎藤 弥八
名大院工
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Kobayashi Keisuke
JASRI SPring8
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SUGAWA Shigetoshi
Graduate School of Engineering, Tohoku University
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HATTORI Takeo
Musashi Institute of Technology
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Sugawa S
Graduate School Of Engineering Tohoku University
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Ohmi Tadahiro
The New Industry Creation Hatchery Center (niche) Tohoku University
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Saito Yahachi
Department Of Applied Physics Faculty Of Engineering Nagoya Universtiy
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Ikenaga Eiji
Japan Synchrotron Radiation Research Institute
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Hattori Tetsuya
Depaetment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Saito Yuji
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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AHARONI Herzl
New Industry Creation Hatchery Center, Tohoku University
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SEKINE Katsuyuki
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
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Saito Y
Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University
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ARATANI Takashi
Shin-Etsu Chemical Co., Ltd.
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HIGUCHI Masaaki
TOSHIBA CORPORATION
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HATTORI Takeo
New Industry Creation Hatchery Center, Tohoku University
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TERAMOTO Akinobu
The New Industry Creation Hatchery Center (NICHe), Tohoku University
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HATTORI Takeo
The New Industry Creation Hatchery Center (NICHe), Tohoku University
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IKENAGA Eiji
JASRI/SPring8
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HIRAYAMA Masaki
New Industry Creation Hatchery Center, Tohoku University
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Hattori Takashi
Central Research Laboratory Hitachi Ltd.
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Teramoto Akinobu
New Industry Creation Hatchery Center Tohoku University
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Teramoto Akinobu
Ulsi Laboratory Mitsubishi Electric Corporation
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Teramoto Akinobu
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Hirayama Masaki
Toshiba Corporation
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Gaubert Philippe
New Industry Creation Hatchery Center Tohoku University
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Nohira Hiroshi
Faculty Of Engineering Musashi Institute Of Technology
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Hattori T
New Industry Creation Hatchery Center Tohoku University
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Kanemoto Kei
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Nakazawa Hiroshi
New Industry Creation Hatchery Center Tohoku University
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YAMAMOTO Masashi
New Industry Creation Hatchery Center, Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center Tohoku Univ.
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Saito Yuji
Department Of Anesthesiology Gunma Prefectural Cardiovascular Center
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Yamamoto Masashi
New Industry Creation Hatchery Center Tohoku University
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Hattori Takeo
Faculty Of Engineering Musashi Institute Of Technology
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Aratani Takashi
Shin-etsu Chemical Co. Ltd.
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Teramoto Akinobu
University Of Tohoku New Industry Creation Hatchery Center (niche)
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Sekine K
Japan Aviation Electronics Ind. Ltd. Tokyo Jpn
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Sekine Katsuyuki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Kobayashi Keisuke
Jasri/spring8
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Teramoto Akinobu
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Hattori Takeo
Musashi Institute of Technology, Tamazutsumi, Setagaya-ku, Tokyo 158-8857, Japan
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Nohira Hiroshi
Musashi Institute of Technology, Tamazutsumi, Setagaya-ku, Tokyo 158-8857, Japan
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Higuchi Masaaki
Graduate School of Engineering, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Aratani Takashi
Graduate School of Engineering, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Shinagawa Seiji
Musashi Institute of Technology, Tamazutsumi, Setagaya-ku, Tokyo 158-8857, Japan
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Hamada Tatsufumi
Graduate School of Engineering, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
著作論文
- Low Temperature Gate Oxidation MOS Transistor Produced by Kr/O_2 Microwave Excited High-Density Plasma
- Electric characteristics of Si_3N_4 films formed by directly radical nitridation on Si (110) and Si (100) surfaces
- Suppression of the low frequency noise level in (100) and (110) oriented silicon p-MOSFETs induced by an alkali-free cleaning process
- A Comparative Examination of Polyoxide Films Performance Grown by Conventional Dry Thermal (900℃) or Plasma Assisted (400℃) Oxidation Techniques
- Dopant-Induced Defects Formed by Ion Implantation : Dopant Species Dependence
- Electric Characteristics of Si3N4 Films Formed by Directly Radical Nitridation on Si(110) and Si(100) Surfaces