Hamada Tatsufumi | Graduate School of Engineering, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

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概要

• Hamada Tatsufumiの詳細を見る
• 同名の論文著者
• Graduate School of Engineering, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japanの論文著者

関連著者

• HATTORI Takeo

  Musashi Institute of Technology

• NOHIRA Hiroshi

  Musashi Institute of Technology

• HIGUCHI Masaaki

  Graduate School of Engineering, Tohoku University

• ARATANI Takashi

  Graduate School of Engineering, Tohoku University

• SHINAGAWA Seiji

  Musashi Institute of Technology

• Sugawa Shigetoshi

  Graduate School Of Engineering Tohoku University

• Hamada Tatsufumi

  Graduate School Of Engineering Tohoku University

• Ohmi Tadahiro

  New Industry Creation Hatchery Center (niche) Tohoku University

• Teramoto Akinobu

  New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

• Teramoto Akinobu

  New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan

• Hattori Takeo

  Musashi Institute of Technology, Tamazutsumi, Setagaya-ku, Tokyo 158-8857, Japan

• Ikenaga Eiji

  JASRI/Spring-8, Kouto, Mikazuki, Hyogo 679-5198, Japan

• Nohira Hiroshi

  Musashi Institute of Technology, Tamazutsumi, Setagaya-ku, Tokyo 158-8857, Japan

• Higuchi Masaaki

  Graduate School of Engineering, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

• Aratani Takashi

  Graduate School of Engineering, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

• Shinagawa Seiji

  Musashi Institute of Technology, Tamazutsumi, Setagaya-ku, Tokyo 158-8857, Japan

• Hamada Tatsufumi

  Graduate School of Engineering, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

• IKENAGA Eiji

  JASRI/Spring-8

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著作論文

• Electric Characteristics of Si3N4 Films Formed by Directly Radical Nitridation on Si(110) and Si(100) Surfaces

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