Abrupt and Arbitrary Profile Formation in Silicon Using a Low-Kinetic-Energy Ion Bombardment Process

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-02-28

著者

• Ohmi Tadahiro

  Department Of Electronic Engineering Graduate School Of Engineering Tohoku University

• HIRAYAMA Masaki

  Department of Electronic Engineering, Graduate School of Engineering, Tohoku University

• Hirayama Masaki

  Department Of Electronic Engineering Faculty Of Engineering Tohoku University

• Shindo Wataru

  Department of Electronic Engineering, Faculty of Engineering, Tohoku University

• Ohmi Tadahiro

  Department Of Electronic Engineering

• Hirayama M

  Tohoku Univ. Sendai Jpn

• Shindo W

  Tohoku Univ. Sendai Jpn

• Shindo Wataru

  Department Of Electronic Engineering Faculty Of Engineering Tohoku University

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