Improvement of Rinsing Efficiency after Sulfuric Acid Hydrogen Peroxide Mixture ( H2SO4/H2O2) by HF Addition
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概要
- 論文の詳細を見る
We report on the improvement in efficiency of deionized water rinsing after using a H2SO4/H2O2/HF mixture which produces hydrophobic Si surfaces by means of fluorine passivation, providing better sulfur removal and shorter rinsing time than the conventional H2SO4/H2O2 mixture. After removing this passivation agent by rinsing in deionized water, the surfaces are still covered with chemical oxide, which protects them from organic contamination. Furthermore this treatment does not induce surface roughening.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1996-04-15
著者
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Ohmi Tadahiro
Department Of Electronic Engineering
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VERHAVERBEKE Steven
Department of Electronics, Faculty of Engineering Tohoku University
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MESSOUSSI Rochdi
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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YABUNE Tatsuhiro
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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Nose Masashi
Department Of Electronics Faculty Of Engineering Tohoku University
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Yabune Tatsuhiro
Department of Electronic Engineering, Faculty of Engineering, Tohoku University, Aza-Aoba, Aramaki,
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Messoussi Rochdi
Department of Electronic Engineering, Faculty of Engineering, Tohoku University, Aza-Aoba, Aramaki,
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Verhaverbeke Steven
Department of Electronic Engineering, Faculty of Engineering, Tohoku University, Aza-Aoba, Aramaki,
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