The Evaluation of New Amorphous Hydrocarbon Film aCHx, for Copper Barrier Dielectric Film in Low-k Copper Metallization

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概要

• 論文の詳細を見る
• 2007-09-19

著者

• TERAMOTO Akinobu

  New Industry Creation Hatchery Center, Tohoku University

• OHMI Tadahiro

  New Industry Creation Hatchery Center, Tohoku University

• Teramoto A

  New Industry Creation Hatchery Center Tohoku University

• Ohmi T

  Tohoku Univ. Sendai‐shi Jpn

• HIGUCHI Masaaki

  TOSHIBA CORPORATION

• HIRAYAMA Masaki

  New Industry Creation Hatchery Center, Tohoku University

• ISHIKAWA Hiraku

  TOKYO ELECTRON LTD.

• NOZAWA Toshihisa

  TOKYO ELECTRON LTD.

• MATSUOKA Takaaki

  TOKYO ELECTRON LTD.

• ITO Takashi

  Graduate School of Engineering, Tohoku University

• Teramoto Akinobu

  New Industry Creation Hatchery Center Tohoku University

• Teramoto Akinobu

  Department Of Electronic Engineering Faculty Of Engineering Tohoku University

• Hirayama Masaki

  Toshiba Corporation

• Hirayama Masaki

  New Industry Creation Hatchery Center Tohoku University

• Terasaki Masato

  Tokyo Electron Ltd.

• Ohmi Tadahiro

  New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University

• Takahashi Ichirou

  Graduate School Of Engineering Tohoku University

• Teramoto Akinobu

  New Industry Creation Hatchery Center Tohoku Univ.

• Teramoto Akinobu

  University Of Tohoku New Industry Creation Hatchery Center (niche)

• Ohmi Tadahiro

  New Industry Creation Hatchery Center (niche) Tohoku University

• Teramoto Akinobu

  New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan

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