NOZAWA Toshihisa | TOKYO ELECTRON LTD.
スポンサーリンク
概要
関連著者
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NOZAWA Toshihisa
TOKYO ELECTRON LTD.
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MATSUOKA Takaaki
TOKYO ELECTRON LTD.
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
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Miyatani Kotaro
Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan
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Kobayashi Yasuo
Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan
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ISHIKAWA Hiraku
TOKYO ELECTRON LTD.
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ITO Takashi
Graduate School of Engineering, Tohoku University
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Sugawa Shigetoshi
Graduate School Of Engineering Tohoku University
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Hirayama Masaki
New Industry Creation Hatchery Center Tohoku University
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KUROKI Shin-Ichiro
Graduate School of Engineering, Tohoku University
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Nemoto Takenao
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
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Miyatani Kotaro
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Kobayashi Yasuo
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Tomita Yugo
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
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Saito Akane
Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan
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Gu Xun
Graduate School of Engineering, Tohoku University
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TERAMOTO Akinobu
New Industry Creation Hatchery Center, Tohoku University
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OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
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Teramoto A
New Industry Creation Hatchery Center Tohoku University
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Kuroda Rihito
Graduate School Of Engineering Tohoku University
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MATSUMOTO Hirokazu
Zeon Corporation
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Ohmi T
Tohoku Univ. Sendai‐shi Jpn
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HIGUCHI Masaaki
TOSHIBA CORPORATION
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HIRAYAMA Masaki
New Industry Creation Hatchery Center, Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center Tohoku University
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Teramoto Akinobu
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Hirayama Masaki
Toshiba Corporation
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Terasaki Masato
Tokyo Electron Ltd.
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Ohmi Tadahiro
New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University
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Kikuchi Yoshiyuki
Tokyo Metropolitan Matsuzawa Hospital
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Takahashi Ichirou
Graduate School Of Engineering Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center Tohoku Univ.
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Kawase Kazumasa
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Teramoto Akinobu
University Of Tohoku New Industry Creation Hatchery Center (niche)
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Teramoto Akinobu
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
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Gu Xun
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Hirayama Masaki
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
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Nemoto Takenao
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
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Nemoto Takenao
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Kawamura Kohei
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Nakamura Masahiro
Zeon Corporation, Chiyoda, Tokyo 100-8246, Japan
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Ito Azumi
Zeon Corporation, Chiyoda, Tokyo 100-8246, Japan
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Shirotori Akihide
Zeon Corporation, Chiyoda, Tokyo 100-8246, Japan
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Ueda Hirokazu
Tokyo Electron Technology Development Institute Inc., Amagasaki, Hyogo 660-0891, Japan
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Kuroda Rihito
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Kikuchi Yoshiyuki
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Tanaka Yoshinobu
Tokyo Electron Technology Development Institute Inc., Amagasaki, Hyogo 660-0891, Japan
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Kawase Kazumasa
Advanced Technology R&D Center, Mitsubishi Electric Corporation, Amagasaki, Hyogo 661-8661, Japan
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Matsuoka Takaaki
Tokyo Electron Technology Development Institute, Inc., Sendai 981-3131, Japan
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Matsuoka Takaaki
Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan
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Matsuoka Takaaki
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Nozawa Toshihisa
Tokyo Electron Technology Development Institute, Inc., Sendai 981-3131, Japan
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Nozawa Toshihisa
Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan
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Nozawa Toshihisa
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Kuroki Shin-Ichiro
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Ito Takashi
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Ohsawa Yusuke
Tokyo Electron Technology Development Institute Inc., Amagasaki, Hyogo 660-0891, Japan
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Shirotori Akihide
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
著作論文
- The Evaluation of New Amorphous Hydrocarbon Film aCHx, for Copper Barrier Dielectric Film in Low-k Copper Metallization
- Electrical characteristics of novel non-porous low-k dielectric fluorocarbon on Cu interconnects for 22nm generation and beyond (Special issue: Advanced metallization for ULSI applications)
- High-Quality SiO2 Film Formation below 400 °C by Plasma Enhanced Chemical Vapor Deposition Using Tetraethoxysilane Source Gas
- Robust Ultralow-k Dielectric (Fluorocarbon) Deposition by Microwave Plasma-Enhanced Chemical Vapor Deposition
- Integration Process Development for Improved Compatibility with Organic Non-Porous Ultralow-k Dielectric Fluorocarbon on Advanced Cu Interconnects
- Evaluation of New Amorphous Hydrocarbon Film for Copper Barrier Dielectric Film in Low-$k$ Copper Metallization