Nozawa Toshihisa | Tokyo Electron Technology Development Institute, Inc., Sendai 981-3131, Japan

スポンサーリンク

概要

• Nozawa Toshihisaの詳細を見る
• 同名の論文著者
• Tokyo Electron Technology Development Institute, Inc., Sendai 981-3131, Japanの論文著者

関連著者

• ISHIKAWA Hiraku

  TOKYO ELECTRON LTD.

• NOZAWA Toshihisa

  TOKYO ELECTRON LTD.

• MATSUOKA Takaaki

  TOKYO ELECTRON LTD.

• ITO Takashi

  Graduate School of Engineering, Tohoku University

• Hirayama Masaki

  New Industry Creation Hatchery Center Tohoku University

• Ohmi Tadahiro

  New Industry Creation Hatchery Center (niche) Tohoku University

• Teramoto Akinobu

  New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan

• Teramoto Akinobu

  New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan

• Hirayama Masaki

  New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan

• Matsuoka Takaaki

  Tokyo Electron Technology Development Institute, Inc., Sendai 981-3131, Japan

• Nozawa Toshihisa

  Tokyo Electron Technology Development Institute, Inc., Sendai 981-3131, Japan

• Ito Takashi

  Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan

もっと見る 閉じる

著作論文

• Evaluation of New Amorphous Hydrocarbon Film for Copper Barrier Dielectric Film in Low-$k$ Copper Metallization

スポンサーリンク