Nozawa Toshihisa | Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan

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概要

• Nozawa Toshihisaの詳細を見る
• 同名の論文著者
• Tokyo Electron Technology Development Institute, Sendai 981-3137, Japanの論文著者

関連著者

• MATSUMOTO Hirokazu

  Zeon Corporation

• NOZAWA Toshihisa

  TOKYO ELECTRON LTD.

• MATSUOKA Takaaki

  TOKYO ELECTRON LTD.

• Kikuchi Yoshiyuki

  Tokyo Metropolitan Matsuzawa Hospital

• Nemoto Takenao

  Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan

• Miyatani Kotaro

  Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan

• Kobayashi Yasuo

  Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan

• Kawamura Kohei

  Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan

• Nakamura Masahiro

  Zeon Corporation, Chiyoda, Tokyo 100-8246, Japan

• Ito Azumi

  Zeon Corporation, Chiyoda, Tokyo 100-8246, Japan

• Shirotori Akihide

  Zeon Corporation, Chiyoda, Tokyo 100-8246, Japan

• Miyatani Kotaro

  Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan

• Kikuchi Yoshiyuki

  Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan

• Kobayashi Yasuo

  Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan

• Matsuoka Takaaki

  Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan

• Nozawa Toshihisa

  Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan

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著作論文

• Robust Ultralow-k Dielectric (Fluorocarbon) Deposition by Microwave Plasma-Enhanced Chemical Vapor Deposition

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