Miyatani Kotaro | Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan
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概要
- Miyatani Kotaroの詳細を見る
- 同名の論文著者
- Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japanの論文著者
関連著者
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NOZAWA Toshihisa
TOKYO ELECTRON LTD.
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MATSUOKA Takaaki
TOKYO ELECTRON LTD.
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Miyatani Kotaro
Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan
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Kobayashi Yasuo
Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan
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Sugawa Shigetoshi
Graduate School Of Engineering Tohoku University
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KUROKI Shin-Ichiro
Graduate School of Engineering, Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
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Nemoto Takenao
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
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Miyatani Kotaro
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Kobayashi Yasuo
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Tomita Yugo
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
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Saito Akane
Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan
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Gu Xun
Graduate School of Engineering, Tohoku University
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Kuroda Rihito
Graduate School Of Engineering Tohoku University
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MATSUMOTO Hirokazu
Zeon Corporation
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Kikuchi Yoshiyuki
Tokyo Metropolitan Matsuzawa Hospital
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Kawase Kazumasa
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Gu Xun
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Nemoto Takenao
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
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Nemoto Takenao
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Kawamura Kohei
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Nakamura Masahiro
Zeon Corporation, Chiyoda, Tokyo 100-8246, Japan
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Ito Azumi
Zeon Corporation, Chiyoda, Tokyo 100-8246, Japan
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Shirotori Akihide
Zeon Corporation, Chiyoda, Tokyo 100-8246, Japan
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Kuroda Rihito
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Kikuchi Yoshiyuki
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Kawase Kazumasa
Advanced Technology R&D Center, Mitsubishi Electric Corporation, Amagasaki, Hyogo 661-8661, Japan
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Matsuoka Takaaki
Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan
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Matsuoka Takaaki
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Nozawa Toshihisa
Tokyo Electron Technology Development Institute, Inc., Nirasaki, Yamanashi 407-0175, Japan
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Nozawa Toshihisa
Tokyo Electron Technology Development Institute, Sendai 981-3137, Japan
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Kuroki Shin-Ichiro
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Shirotori Akihide
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
著作論文
- Electrical characteristics of novel non-porous low-k dielectric fluorocarbon on Cu interconnects for 22nm generation and beyond (Special issue: Advanced metallization for ULSI applications)
- Robust Ultralow-k Dielectric (Fluorocarbon) Deposition by Microwave Plasma-Enhanced Chemical Vapor Deposition
- Integration Process Development for Improved Compatibility with Organic Non-Porous Ultralow-k Dielectric Fluorocarbon on Advanced Cu Interconnects