Precise Control of Gas Concentration Ratio in Process Chamber : Instrumentation, Measurement, and Fabrication Technology
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概要
- 論文の詳細を見る
A new system for controlling gas concentration in a process chamber was developed using a combination of a new flow controller and a gas pumping system. The new flow controller does not exhibit overshooting; thus, a stable gas flow rate can be realized in a process chamber after valve operation. Furthermore, very rapid gas displacement in the chamber can be realized by combined gas flow system and pumping system. As a result, it took only 2s to stabilize chamber pressure and gas composition from purge gas to process gases using Fourier transform infrared spectroscopy (FT-IR) method. It is possible to control process parameters such as gas concentration and working pressure during the entire process using this system.
- 社団法人応用物理学会の論文
- 2001-08-15
著者
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Ohmi Tadahiro
New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University
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Kitano M
Shimane Univ. Matsue Jpn
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Shirai Yasuyuki
New Industry Creation Hatchery Center Tohoku University
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NAGASE Masaaki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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KITANO Masafumi
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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SHIRAI Yasuyuki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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Nagase Masaaki
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Nagase Masaaki
Department Of Applied Chemistry Faculty Of Engineering Oita University
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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SHIRAI Yasuyuki
Department of Agricultural Chemistry, Faculty of Horticulture, Chiba University
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