Inoue Masao | Process Development Department, Process Technology Development Division, Production and Technology Unit, RENESAS Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
スポンサーリンク
概要
- Inoue Masaoの詳細を見る
- 同名の論文著者
- Process Development Department, Process Technology Development Division, Production and Technology Unit, RENESAS Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japanの論文著者
関連著者
-
Inoue Masao
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
-
Inoue Masao
Process Development Department, Process Technology Development Division, Production and Technology Unit, RENESAS Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Umeda Hiroshi
Process Development Dept. Wafer Process Engineering Development Div. Lsi Manufacturing Unit Renesas
-
Tsujikawa Shimpei
Process Development Dept. Wafer Process Engineering Development Div. Lsi Manufacturing Unit Renesas
-
Kawase Kazumasa
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
-
Teramoto Akinobu
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
-
Umeda Hiroshi
Process Development Department, Process Technology Development Division, Production and Technology Unit, RENESAS Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Tsujikawa Shimpei
Process Development Department, Process Technology Development Division, Production and Technology Unit, RENESAS Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
INOUE Masao
Process Development Dept., Wafer Process Engineering Development Div., LSI Manufacturing Unit, Renes
-
Mori Kenichi
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
-
Mizutani Masaharu
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
-
Yugami Jiro
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
-
Yamanari Shinichi
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
-
Akamatsu Yasuhiko
Process Development Dept. Wafer Process Engineering Development Div. Lsi Manufacturing Unit Renesas
-
Sakashita Shinsuke
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
-
Yoneda Masahiro
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
-
Teramoto Akinobu
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aoba Aramaki, Aoba-ku, Sendai 980-8579, Japan
-
Suwa Tomoyuki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 6-6-10 Aoba Aramaki, Aoba-ku, Sendai 980-8579, Japan
-
Higuchi Masaaki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 6-6-10 Aoba Aramaki, Aoba-ku, Sendai 980-8579, Japan
-
Sakashita Shinsuke
Process Development Department, Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation
-
YONEDA Masahiro
Process Development Department, Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation
-
Akamatsu Yasuhiko
Process Development Department, Wafer Process Engineering Development Division, LSI Manufacturing Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Ohmi Tadahiro
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aoba Aramaki, Aoba-ku, Sendai 980-8579, Japan
-
Yoneda Masahiro
Process Development Department, Process Technology Development Division, Production and Technology Unit, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
TERAMOTO Akinobu
New Industry Creation Hatchery Center, Tohoku University
-
OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
-
MORI Kenichi
Process Technology Development Division Renesas Technology Corporation
-
KAWASE Kazumasa
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
UMEDA Hiroshi
Process Development Dept., Wafer Process Engineering Development Div., LSI Manufacturing Unit, Renes
-
TSUJIKAWA Shimpei
Process Development Dept., Wafer Process Engineering Development Div., LSI Manufacturing Unit, Renes
-
AKAMATSU Yasuhiko
Process Development Dept., Wafer Process Engineering Development Div., LSI Manufacturing Unit, Renes
-
Ohmi Tadahiro
Tohoku Univ. Sendai Jpn
-
HATTORI Takeo
New Industry Creation Hatchery Center, Tohoku University
-
YONEDA Masahiro
Process Technology Development Division, Renesas Technology Corp.
-
YUGAMI Jiro
Process Technology Development Div., Renesas Technology Corp.
-
Teramoto Akinobu
Tohoku Univ. Sendai Jpn
-
Sugawa Shigetoshi
Department Of Electronic Engineering Tohoku University
-
Miyatake Hiroshi
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
-
Ohmi Tadahiro
New Industry Creation Hatchery Center Future Information Industry Creation Center Tohoku University
-
SAKASHITA Shinsuke
Process Development Dept., Process Technology Development Div., Production and Technology Unit, Rene
-
TANAKA Kazuki
Process Engineering Section, Wafer Process Engineering Dept., Renesas Semiconductor Engineering Corp
-
YAMANARI Shinichi
Process Development Dept., Process Technology Development Div., Production and Technology Unit, Rene
-
Tanaka Kazuki
Process Engineering Section Wafer Process Engineering Dept. Renesas Semiconductor Engineering Corpor
-
Teramoto Akinobu
New Industry Creation Hatchery Center Tohoku Univ.
-
Nishida Yukio
Process Technology Development Div. Renesas Technology Corp.
-
Tsuchimoto Junichi
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
-
Sakashita Shinsuke
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
-
Yoneda Masahiro
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
-
Inoue Masao
Process Development Dept. Wafer Process Engineering Development Div. Lsi Manufacturing Unit Renesas
-
Murata Naofumi
Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Mori Kenichi
Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Kawahara Takaaki
Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Higashi Masahiko
Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Honda Kazuhito
Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Yoshimura Hidefumi
Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Komura Masanori
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 6-6-10 Aoba Aramaki, Aoba-ku, Sendai 980-8579, Japan
-
Sakashita Shinsuke
Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Hattori Takeo
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aoba Aramaki, Aoba-ku, Sendai 980-8579, Japan
-
Inoue Masao
Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Inoue Masao
Process Development Department, Wafer Process Engineering Development Division, LSI Manufacturing Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Umeda Hiroshi
Process Development Department, Wafer Process Engineering Development Division, LSI Manufacturing Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Kawase Kazumasa
Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki, Hyogo 661-8661, Japan
-
TSUCHIMOTO Junichi
Process Development Department, Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation
-
Tsuchimoto Junichi
Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Nishida Yukio
Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Tsujikawa Shimpei
Process Development Department, Wafer Process Engineering Development Division, LSI Manufacturing Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Sugawa Shigetoshi
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 6-6-10 Aoba Aramaki, Aoba-ku, Sendai 980-8579, Japan
著作論文
- Control of nitrogen profile in radical nitridation of SiO_2 films
- Low temperature divided CVD technique for TiN metal gate electrodes of p-MISFETs
- Diffusion Control Techniques for TiN Stacked Metal Gate Electrodes for p-Type Metal Insulator Semiconductor Field Effect Transistors
- Control of Nitrogen Depth Profile near Silicon Oxynitride/Si(100) Interface Formed by Radical Nitridation
- Control of Nitrogen Depth Profile and Chemical Bonding State in Silicon Oxynitride Films Formed by Radical Nitridation