Twisted Differential Transmission Line Structure for EMI Noise Reduction at Global Interconnect in Si LSI
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概要
- 論文の詳細を見る
- 2004-09-15
著者
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Masu K
Research Institute Of Electrical Communication Tohoku University
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Masu Kazuya
Integrated Research Institute
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Masu Kazuya
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Ito H
National Agricultural Res. Organization Mie Jpn
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Okada K
Communications Research Laboratory Ministry Of Posts And Telecommunications
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Okada K
The Design Technology Development Laboratory Ic Group Sharp Corporation
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GOMI Shinichiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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ITO Hiroyuki
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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OKADA Kenichi
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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Gomi Shinichiro
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Masu Kazuya
東工大
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Ito Hiroyuki
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Itoh H
Osaka Univ. Pharmaceutical Sci. Osaka Jpn
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Okada K
Keio Univ. Yokohama‐shi Jpn
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Ito H
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Sugawara Hirotaka
Integrated Research Institute Tokyo Institute Of Technology
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SUGITA Hideyuki
Integrated Research Institute, Tokyo Institute of Technology
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SUGITA Hideyuki
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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