Capacitance Network Model of the Short Channel Effect for 0.1 μm Fully Depleted SOI MOSFET

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概要

• 論文の詳細を見る
• 1996-02-01

著者

• 黄 俐昭

  Necシリコンシステム研究所

• Kato Haruo

  Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.

• Kato Hiroyo

  Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.

• Kato Haruo

  Ulsi Device Development Laboratories Nec Corporation

• Koh Risho

  Microelectronics Reserch Laboratory Nec Corp.

• Koh Risho

  Silicon Systems Research Laboratory Nec Corporation

• Koh Risho

  Microelectronics Res. Labs. Nec Corp.

• MATSUMOTO Hiroshi

  Microelectronics Research Laboratories, NEC Corporation

• Matsumoto Hiroshi

  Microelectronics Research Laboratories Nec Corporation

関連論文

• C-11-2 垂直電界に関するバルクMOSFETとSOI-MOSFETの比較
• 素子微細化が真性半導体ボディSOI-MOSFETのI_向上効果に与える影響
• 素子微細化が真性半導体ボディSOI-MOSFETのI_向上効果に与える影響
• 真性チャネルSOI-MOSFETのV_ばらつきに対する電界の二次元効果の影響
• ストライプトゲート真性半導体チャネルSOI-MOSFETのしきい値制御に関するシミュレーション
• アクセプタからの電界の二次元的発散を考慮したSOI-MOSFETのしきい値電圧モデル
• 完全空乏化及び部分空乏化型SOI-MOSFETの短チャネル効果に関する容量ネットワークモデルに基づく比較
• SOIMOSFETの基板浮遊効果に及ぼすキャリア消滅の影響についての解析
• Simulated Device Design Optimization to Reduce the Floating Body Effect for Sub-Quarter Micron Fully Depleted SOI-MOSFETs (Special Issue on New Concept Device and Novel Architecture LSIs)
• Effects of H_2 Sintering and Pt Upper Electrode on Metallic Bi Content in Sr_Bi_Ta_2O_9 Thin Films for Ferroelectric Memories Prepared by Sol-Gel Method
• Low Voltage Operation of Ferroelectric Sr_Bi_Ta_2O_9 Thin Films Crystallized by Excimer Laser Annealing
• ELFIN (ELevated Field INsulator) and SEP (S/D Elevated by Poly-Si Plugging) Process for Ultra-Thin SOI MOSFETs
• ELFIN (ELevated Field INsulator) and SEP (S/D Elevated by Poly-Si Plugging) Process for Ultra-Thin SOI MOSFETs
• An Investigation on the Short Channel Effect for 0.1 μm Fully Depleted SOIMOSFET Using Equivalent One Dimensional Model
• Capacitance Network Model of the Short Channel Effect for 0.1 μm Fully Depleted SOI MOSFET
• Modeling on the Channel-To-S/D Capacitance and the Short Channel Effect for 0.1μm Fully Depleted SOI-MOSFET
• The Influence of the Device Miniaturization on the I_ Enhancement in the Intrinsic Silicon Body (i-body) SOI-MOSFET's
• A Study of the V_ Fluctuation for 25nm CMOS
• Simulation on A Novel Sub-0.1μm Body Driven SOI-MOSFET (BD-SOIMOS) for Small Logic Swing Operation
• Simulation on a Novel Body-Driven Silicon-on-Insulator Metal-Oxide-Silicon Field-Effect-Transistor for Sub-0.1 μm Small Logic Swing Operation
• Analysis on the Threshold Voltage Fixing and the Floating-Body-Effect Suppression for 0.1μm Fully Depleted SOI-MOSFET
• Analysis of The Threshold Voltage Adjustment and Floating Body Effect Suppression for 0.1 μm Fully Depleted SOI-MOSFET
• Buried Insulator Engineering for sub-0.05μm Fully-Depleted SOI-MOSFET to Reduce the Drain Induced Barrier Lowering
• Defect-Free Reactive Ion Etching of Silicon by SiF_4/Cl_2 Plasma
• Simulated Threshold Voltage Adjustment and Drain Current Enhancement in Novel Striped-Gate Nondoped-Channel Fully Depleted SOI-MOSFETs
• Buried Layer Engineering to Reduce the Drain-Induced Barrier Lowering of Sub-0.05 μm SOI-MOSFET
• Simulation of Chemical Amplification Resists
• Effects of H2 Sintering and Pt Upper Electrode on Metallic Bi Content in Sr0.9Bi2.1Ta2O9 Thin Films for Ferroelectric Memories Prepared by Sol-Gel Method

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