Tanaka Akira | Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
スポンサーリンク
概要
関連著者
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NISHIKAWA Satoshi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Tanaka Akira
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Nishikawa Satoshi
Semiconductor Tech. Lab. Oki Electric Industry Co. Ltd.
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Nishikawa S
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Yamaji Tetsuo
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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IWABUCHI Toshiyuki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.,
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Iwabuchi Toshiyuki
Research And Development Group Oki Electric Industry Co. Ltd.
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Yamaji Tetsuo
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Uchiyama Akira
Lsi Process Technology Division Oki Electric Industry Co. Ltd.
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YAMAJI Tetuo
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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UCHIYAMA Akira
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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HAYASHI Takahisa
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Yamaji Tetuo
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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IWABUCHI Toshiyuki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Nishikawa Satoshi
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
著作論文
- Modeling of Mechanism of Leakage in a Shallow p^+/n Junction Formed by Preamorphization
- Optimization of the Amorphous Layer Thickness and the Junction Depth in the Preamorphization Method for Shallow-Junction Formation