In Situ Measurements of the Resist Etch Rate for Submicron Patterns

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-07-30

著者

• Murata Kei

  Storage Technologies Research Center Victor Company Of Japan Limited

• Yasuda Makoto

  Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.

• MURATA Kenji

  Department of Applied Physics, Faculty Engineering, Osaka University

• YASUDA Masaaki

  Department of Bioscience and Biotechnology, Faculty of Agriculture, University of the Ryukyus

• MURATA Kenji

  Aichi Works Taketoyo Plant, NOF Co., Ltd.

• MATSUNAGA Takashi

  Department of Medical Informatics, Osaka Medical Center for Cancer and Cardiovascular Diseases

• Kawata H

  Department Of Physics And Electronics Gra4uate School Of Engineering Osaka Prefecture University

• KAWATA Hiroaki

  Department of Physics and Electronics, Osaka Prefecture University

• Fukuda Hiroyoshi

  Department of Physics and Electronics, College of Engineering, Osaka Prefecture University

• Murata K

  Aichi Works Taketoyo Plant Nof Co. Ltd.

• Murata Kenji

  Department Of Animal Science University Of California

• Kawata Hiroaki

  Department Of Electronics College Of Engineering University Of Osaka Prefecture

• Yasuda Masaaki

  Department Of Bioscience And Biotechnology Faculty Of Agriculture University Of The Ryukyus

• Fukuda Hiroyoshi

  Department Of Physics And Electronics College Of Engineering Osaka Prefecture University

• Yasuda M

  Department Of Bioscience And Biotechnology Faculty Of Agriculture University Of The Ryukyus

• Matsunaga Takashi

  Department Of Medical Informatics Osaka Medical Center For Cancer And Cardiovascular Diseases

• Yasuda Masaaki

  Department Of Bioscience And Biotechnology Faculty Of Agriculture University Of Ryukyus

• Matsunaga Takashi

  Department Of Biopharmaceutics Faculty Of Pharmaceutical Sciences Chiba University

• YASUDA Masaaki

  Department of Agricultural Chemistry, University of the Ryukyus

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