Fabrication of 0.2 μm Fine Patterns Using Optical Projection Lithography with an Oil Immersion Lens
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概要
- 論文の詳細を見る
Fine patterns are fabricated by using optical projection lithography with both an oil immersion lens of NA=1.25 and a conventional single-layer resist. Chlorobenzene soak is used in order to remove the immersion oil and to improve the side wall profile of the resist patterns. Some samples are lightly etched by O_2 plasmas in order to remove a residual resist at the bottom of the resist patterns. Finally, it is found that a 0.18 μm fine resist pattern with a good edge definition can be fabricated. Al line and space pattern with a width of about 0.21 μm is also fabricated by lift-off technique.
- 社団法人応用物理学会の論文
- 1992-12-30
著者
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Yoshida Hitoshi
Department Of Anesthesiology Hirosaki University Graduate School Of Medicine
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Yoshida Hitoshi
Department Of Electronics College Of Engineering University Of Osaka Prefecture
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Murata Kenji
Department Of Animal Science University Of California
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Kawata Hiroaki
Department Of Electronics College Of Engineering University Of Osaka Prefecture
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MATSUMURA Ippei
Department of Electronics, College of Engineering, University of Osaka Prefecture
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Murata Kenji
Department Of Electronics College Of Engineering University Of Osaka Prefecture
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Matsumura Ippei
Department Of Electronics College Of Engineering University Of Osaka Prefecture
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