Analysis of Charging Phenomena of Polymer Films on Silicon Substrates under Electron Beam Irradiation
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概要
- 論文の詳細を見る
Charging phenomena of polymer films on silicon substrates under electron beam irradiation are studied by numerical simulation. The initial distribution of the charge deposited in the sample is calculated by a Monte Carlo simulation of electron scattering, and charge drift is simulated by taking into account the Poisson equation, the charge continuity equation, Ohm's law, and electron beam induced conductivity. The dependences of charging on electron energy and polymer thickness are explained by the secondary yield and the relationship between the electron range and polymer film thickness.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-06-25
著者
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Kawata Hiroaki
Department Of Electronics College Of Engineering University Of Osaka Prefecture
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Hirai Yoshihiko
Department Of Bioscience And Biotechnology Faculty Of Agriculture Shinshu University
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Yasuda Masaaki
Department Of Bioscience And Biotechnology Faculty Of Agriculture University Of Ryukyus
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Yasuda Masaaki
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Morimoto Kosuke
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Kainuma Yasuaki
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Kawata Hiroaki
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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YASUDA Masaaki
Department of Agricultural Chemistry, University of the Ryukyus
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