Matsumoto Ryoichi | Lsi Process Technology Division Oki Electric Industry Co. Ltd.
スポンサーリンク
概要
関連著者
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Matsumoto Ryoichi
Lsi Process Technology Division Oki Electric Industry Co. Ltd.
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Arakawa Tomiyuki
Vlsi Research & Development Center Oki Electric Industry Co. Ltd.
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ARAKAWA Tomiyuki
VLSI R & D Center
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林 卓
Department Of Materials Science Shonan Institute Of Technology
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Hayashi Takafumi
Department Of Applied Physics Faculty Of Engineering The University Of Tokyo
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Hayashi Takayoshi
Advanced Research Institute For Science And Engineering Waseda University
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Hayashi Takahisa
Vlsi Research & Development Center Oki Electric Industry Co Ltd.
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Matsumoto Ryoichi
LSI Process Technology Division, Oki Electric Industry Co., Ltd.
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Kita Akio
Vlsi Research & Development Center Oki Electric Industry Co. Ltd.
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Ohno Morifumi
National Institute of Advanced Industrial Science and Technology
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FUKUDA Hisashi
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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大野 守史
沖セミコンダクター(株)
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Fukuda H
Ntt Microsystem Integration Laboratories
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Ohno Morifumi
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Uchiyama Akira
Lsi Process Technology Division Oki Electric Industry Co. Ltd.
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HAYASHI Takahisa
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Arakawa Tomiyuki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.:(present Address)department Of El
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Arakawa Tomiyuki
Semiconductor Technology Laboratory Oki Electric Industry Co. Lid.
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大野 守史
静岡大学電子工学研究所
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Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Lid.
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大野 守史
(株) ソルテック
著作論文
- Relationship between Nitrogen Profile and Reliability of Heavily Oxynitrided Tunnel Oxide Films for Flash Electrically Erasable and Programmable ROMs
- Impact of Tunnel Film Oxynitridation on Band-to-Band Tunneling Current and Electron Injection in Flash Memory
- Tunnel Oxynitride Film Formation for Highly Reliable Flash Memory (Special Issue on ULSI Memory Technology)
- Effect of Nitrogen Profile on Tunnel Oxynitride Degradation with Charge Injection Polarity
- Effect of Nitrogen Profile on Tunnel Oxynitride Degradation with Charge Injection Polarity