Etching Characteristics of Organic Polymers in the Magnetic Neutral Loop Discharge Plasma
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-03-15
著者
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Uchida T
Institute For Semiconductor Technologies Ulvac Inc.
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Uchida Taijiro
Institute Of Plasma Physics Nagoya University
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Uchida Tsutomu
National Institute Of Advanced Industrial Science And Technology(aist)
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MORIKAWA Yasuhiro
Institute for Semiconductor Technologies, ULVAC, Inc.
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HAYASHI Toshio
Institute for Semiconductor Technologies, ULVAC, Inc.
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