Conelike Defect in Deep Quartz Etching Employing Neutral Loop Discharge
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-10-15
著者
-
堀池 靖浩
物質・材料研究機構
-
HORIIKE Yasuhiro
Department of Electrical Engineering, Toyo University
-
FUKASAWA Takayuki
Department of Electrical Engineering, Hiroshima University
-
HAYASHI Toshio
Institute for Semiconductor Technologies, ULVAC, Inc.
関連論文
- ナノピラー構造体が電気浸透流に及ぼす影響の評価
- Negative Ion Assisted Silicon Oxidation in Downstream of Microwave Plasma
- Measurement of Fluorocarbon Radicals Generated from C_4F_8/H_2 Inductively Coupled Plasma : Study on SiO_2 Selective Etching Kinetics
- Microloading Effect in Highty Selective Si0_2 Contact Hole Etching Employing Inductively Coupled Plasma
- Effect of Magnetic Field to Etching Characteristics of Inductively Coupled Plasma ( Plasma Processing)
- High Rate and Highly Selective SiO_2 Etching Employing Inductively Coupled Plasma
- RF Self-Bias Characteristics in Inductively Coupled Plasma
- Al Etching Characteristics Ernploying Helicon Wave Plasma
- Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
- Gap-filling of Cu Employing Sustained Self-Sputtering with Inductively Coupled Plasma Ionization
- Long Line-Shaped Microwave Plasma Generation Employing a Narrow Rectangular Waveguide
- Deep dry etching of quartz plate over 100μm in depth for the fabrication of high performance analytical chip(ABSTRACTS OF PROCEEDINGS OF THE SCHOOL OF INFORMATION TECHNOLOGY AND ELECTRONICS SERIES J TOKAI UNIVERSITY -2003-2004-)
- A Model for Resolution Dependent Roughness Values Measured by an Optical Profiler for Specific Surfaces
- Enhancement of Negative-Ion-Assisted Silicon Oxidation by Radio-Frequency Bias
- Development and Plasma Characteristics Measurement of Planar-Type Magnetic Neutral Loop Discharge Etcher
- Highly Selective SiO_2/Si Etching and Related Kinetics in Time-Modulated Helicon Wave Plasma
- SiO_2 Etching Employing Inductively Coupled Plasma with Hot Inner Wall
- Mechanism of Cloudy Surface Generation on Si Wafer Employing Numerically Controlled Local Dry Etching (NC-LDE)
- In-Situ X-Ray Photoelectron Spectroscopy of Reactive-Ion-Etched Surfaces of Indium-Tin Oxide Film Employing Alcohol Gas
- Concentration and Injection of Long Deoxyribonucleic Acid Molecules at the Interface of Micro- and Nano-channels
- Curvature Entropy Trapping of Long DNA under Hydrodynamic Flows in Microfluidic Devices
- Fluorescence Emission Control of Long DNA Molecules Adsorbed on microelectrode Surfaces by External Voltage
- Healthcare Chip for Checking Health Condition from Analysis of Trace Blood Collected by Painless Needle
- Study on the Mechanisms of Chemical Mechanical Polishing on Copper and Aluminum Surfaces Employing In Situ Infrared Spectroscopy
- Molecular Detection in a Microfluidic Device by Streaming Current Measurements
- Translocation of a Long DNA Chain Passing Through a Nanofabricated Pore
- Study on Elemental Technologies for Creation of Healthcare Chip Fabricated on Polyethylene Terephthalate Plate
- A Study on Mechanism of Chemical Mechanical Polishing on Al and Cu Surfaces Employing In-situ Infrared Spectroscopy
- 多項目同時測定ヘルスケアチップ用マイクログルコースセンサーの創製
- Cleaning of Silicon Surfaces by NF_3-Added Hydrogen and Water-Vapor Plasma Downstream Treatment
- Heliconwave Plasma Which Contains Negative Ion
- 高齢化社会の到来とヘルスケアチップの創製 : ドライエッチング技術の展開
- Biochip Which Examines Hepatic Function by Employing Colorimetric Method
- Etching Characteristics of Organic Polymers in the Magnetic Neutral Loop Discharge Plasma
- Investigations of Surface Reactions in Neutral Loop Discharge Plasma for High-Aspect-Ratio SiO_2 Etching
- 無痛針用Niフリーステンレス鋼細管の機械的特性(第1回論文特集号)
- プラズマプロセスによるバイオチップの開発と展望
- 大気圧マイクロプラズマジェットの微細加工への応用
- Etching Reactivity of Negative Ions Generated in Cl_2 Downstream Plasma
- Electron Energy Control in Inductively Coupled Plasma Employing Multimode Antenna
- Thin Film Detection Employing Frequency Shift in Sheath Current Oscillation
- Excitation of Sheath Oscillating Current by Superimposing Pulse Voltage
- Atomic Layer Controlled Digital Etching of Silicon : Etching and Deposition Technology
- Atomic Layer Controlled Digital Etching of Silicon
- Fabrication of Quartz Microcapillary Electrophoresis Chips Using Plasma Etching
- Gap-Filling of Cu Employing Self-Sustained Sputtering with ICP Ionization
- In-Situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces
- Silicon Etching Employing Negative Ion in SF_6 Plasma
- ポリマーチューブ内壁の大気圧プラズマ処理 : ポリ四フッ化エチレンチューブでの結果
- Study on the Mechanism of Silicon Chemical Mechanical Polishing Employing In Situ Infrared Spectroscopy
- Selective Processing of Individual Carbon-Nanotubes Using Atomic Force Microscopy Installed in Transmission Electron Microscope
- Control of Surface Reaction on Highly Accurate Low-k Methylsilsesquioxane Etching Process : Nuclear Science, Plasmas, and Electric Discharges
- A New Inside-Type Segmented Coil Antenna for Uniformity Control in a Large-Area Inductively Coupled Plasma
- Generation of Integrated Atmospheric-Pressure Microplasmas
- Localized Plasma Processing of Materials Using Atmospheric-Pressure Microplasma Jets
- Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge
- 容量結合型大気圧マイクロプラズマ源
- 医療
- Development of Clinical Chips for Home Medical Diagnostics
- 在宅で健康診断できるヘルスケアチップの開発 (特集 診断バイオチップの未来)
- μ-TAS応用によるバイオセンサ式ヘルスケアチップ (特集 流体MEMSのすべて--マイクロ流体デバイスの応用展開とその実用化)
- 産学独連携により2009年115WのEUV光源を実現
- 無痛針採血による在宅健康診断チップ
- 医療用バイオチップの現状と将来展望
- B-5-145 in vivoワイヤレス通信チップ用送受信回路に関する研究(B-5.無線通信システムA(移動通信))
- Conelike Defect in Deep Quartz Etching Employing Neutral Loop Discharge
- B-1-16 in vivo ワイヤレス通信チップ用アンテナに関する研究 : 電磁波の人体透過特性
- Anisotropic Etching of SiO_2 Film and Quartz Plate Employing Anhydrous HF
- Numerically Controlled Dry Etching Technology for Flattening of Si Wafer which Employs SF_6/H_2 Downstream Plasma
- Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with In-situ XPS Measurement : Etching and Deposition Technology
- Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with In-situ XPS Measurement
- Characteristics of Very High-Aspect-Ratio Contact Hole Etching
- Effect of auxin on the incorporation of proline into the naked protoplasm of Chara globularis
- Photoexcited Anisotropic Etching of Single-Crystalline Silicon
- High-Rate Bias Sputtering Filling of SiO2 Film Employing Both Continuous Wave and Time-Modulated Inductively Coupled Plasmas
- Miniaturized Capillary Electrophoresis Fabricated on Pyrex Glass Chips Using Deep Dry Etching and Anodic Bonding
- Healthcare Chip for Checking Health Condition from Analysis of Trace Blood Collected by Painless Needle
- ナノ構造体を用いた無標識検出
- Organic Low-k Dielectric Material Etching by CH_3NH_2/N_2 Plasma
- Initiation of the Planarization of SiO2 Film Employing Anhydrous HF Gas
- Generation of Integrated Atmospheric-Pressure Microplasmas
- Long Line-Shaped Microwave Plasma Generation Employing a Narrow Rectangular Waveguide
- Conelike Defect in Deep Quartz Etching Employing Neutral Loop Discharge