Study on the Mechanisms of Chemical Mechanical Polishing on Copper and Aluminum Surfaces Employing In Situ Infrared Spectroscopy

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-06-15

著者

• OGAWA Hiroki

  Department of Surgery, Otsu Red Cross Hospital

• HORIIKE Yasuhiro

  Department of Electrical Engineering, Toyo University

• Takamura Yuzuru

  Department Of Materials Science School Of Engineering The University Of Tokyo

• KIKUCHI Jun

  Axiomatic Inc.

• TOKUYAMA Yusuke

  Department of Materials Engineering, School of Engineering, The University of Tokyo

• YANAGISAWA Michihiko

  Speedfam Co., Ltd.

• NAKAGAWA Hideo

  Semiconductor Company, Matsushita Electric Industrial Co. Ltd.

• Horiike Yasuhiro

  Department Of Materials Engineering School Of Engineering The University Of Tokyo

• Horiike Yasuhiro

  Department Of Materials Science University Of Tokyo

• Horiike Yasuhiro

  Department Of Electrical Engineering Toyo University

• Kikuchi Jun

  Axiomatec Inc.

• 堀池 靖浩

  広島大工

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