Examination of Surface Elementary Reaction Model for Chemical Vapor Deposition of Al Using In Situ Infrared Reflection Absorption Spectroscopy : Teoretical Optimization Procedure (3)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2002-02-15

著者

• Itoh Hisayoshi

  Institute Of Materials Science University Of Tsukuba

• OGAWA Hiroki

  Department of Surgery, Otsu Red Cross Hospital

• Ogawa H

  Univ. Tokyo Tokyo Jpn

• Itoh H

  Semiconductor Academic Research Center

• SHIMOGAKI Yukihiro

  Department of Materials Engineering, The University of Tokyo

• SUGIYAMA Masakazu

  Department of Electronic Engineering, School of Engineering, University of Tokyo

• Itoh Hitoshi

  Semiconductor Academic Research Center

• Ogawa Hiroki

  Department Of Material Science School Of Engineering University Of Tokyo

• Sugiyama Masaaki

  R & D Laboratories-i Central R & D Bureau Nippon Steel Cotporation

• Sugiyama Masaaki

  Advanced Materials & Technology Research Laboratories Nippon Steel Corporation

• Sugiyama M

  Department Of Electric Engineering And Information Systems School Of Engineering The University Of T

• Sugiyama Munehiro

  Ntt Interdisciplinary Research Laboratories

• KOMIYAMA Hiroshi

  Department of Chemical System Engineering, The University of Tokyo

• SATO Yusuke

  Corporate Research and Development Center, Toshiba Corp.

• AOYAMA Jyun-ichi

  Semiconductor Academic Research Center

• HORIIKE Yasuhiko

  Department of Metallurgy and Material Sciences, School of Engineering, University of Tokyo

• Sugiyama M

  Institute Of Engineering Innovation School Of Engineering The University Of Tokyo

• Shimogaki Yukihiro

  Department Of Materials Engineering Faculty Of Engineering Univerity Of Tokyo

• Sugiyama Masakazu

  Department Of Biotechnology Graduate School Of Agriculture And Life Sciences The University Of Tokyo

• Komiyama H

  Department Of Chemical System Engineering School Of Engineering University Of Tokyo

• Komiyama Hiroshi

  Department Of Chemical Engineering Faculty Of Engineering University Of Tokyo

• Shimogaki Y

  Department Of Materials Engineering School Of Engineering The University Of Tokyo

• Ogawa Hiroki

  Department Of Electrical And Computer Engineering Nagoya Institute Of Technology:(present Address) N

• Horiike Yasuhiko

  Department Of Metallurgy And Material Sciences School Of Engineering University Of Tokyo

• Sato Yusuke

  Corporate Research And Development Center Toshiba Corp.

• Shimogaki Yukihiro

  Department of Electronic Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113, Japan

• Shimogaki Yukihiro

  Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo,

• SHIMOGAKI YUKIHIRO

  Department of Chemical Engineering, University of Tokyo

• Ogawa Hiroki

  Department of Chemistry, School of Science and Engineering, Waseda University

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