Preparation of Low Dielectric Constant F-Doped SiO_2 Films by PECVD

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概要

• 論文の詳細を見る
• 1995-08-21

著者

• NAKANO Yoshiaki

  Department of Surgery, NTT West Osaka Hospital

• Lim S

  Advanced Products Res. And Dev. Lab. Tx Usa

• Lim Sang

  Department Of Chemical System Engineering University Of Tokyo:(present Address)department Of Electri

• TADA Kunio

  Department of Electronic Engineering, The University of Tokyo

• SHIMOGAKI Yukihiro

  Department of Materials Engineering, The University of Tokyo

• Tada Kunio

  Department Of Electronic Engineering Faculty Of Engineering University Of Tokyo

• Nakano Yoshiaki

  Research Center For Advanced Science And Technology Univ. Of Tokyo

• Nakano Y

  Research Center For Advanced Science And Technology The University Of Tokyo

• KOMIYAMA Hiroshi

  Department of Chemical System Engineering, The University of Tokyo

• Nakano Yoshiaki

  Department Of Surgery Ntt West Osaka Hospital

• Shimogaki Yukihiro

  Department Of Materials Engineering Faculty Of Engineering Univerity Of Tokyo

• Komiyama H

  Department Of Chemical System Engineering School Of Engineering University Of Tokyo

• Komiyama Hiroshi

  Department Of Chemical Engineering Faculty Of Engineering University Of Tokyo

• Shimogaki Y

  Department Of Materials Engineering School Of Engineering The University Of Tokyo

• LIM SangWoo

  Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo

• Nakano Yoshiaki

  Department Of Electrical Engineering And Information Systems The University Of Tokyo

• Tada Kunio

  Department Of Electronic Engineering Faculty Of Engineering The University Of Tokyo

• Shimogaki Yukihiro

  Department of Electronic Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113, Japan

• Lim Sangwoo

  Department of Chemical and Biomolecular Engineering, Yonsei University, 134 Shinchon-dong, Seodaemoon-gu, Seoul 120-749, Korea

• Nakano Yukie

  Research Center for Advanced Science and Technology, The University of Tokyo

• Shimogaki Yukihiro

  Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo,

• SHIMOGAKI YUKIHIRO

  Department of Chemical Engineering, University of Tokyo

• Tada Kunio

  Department of Electrical and Computer Engineering, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan

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