Physical and Electrical Characteristics of HfN Metal Gate Electrode Synthesized by Post-Rapid Thermal Annealing-assisted MOCVD
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概要
- 論文の詳細を見る
- 2006-09-13
著者
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Nabatame Toshihide
Mirai-association Of Super-advanced Electronics Technologies (mirai-aset) National Institute Of Adva
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Nabatame T
Aist Tsukuba Jpn
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Nabatame Toshihide
Mirai-aset Advanced Industrial Science And Technology (aist)
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Nabatame Toshihide
Hitachi Research Laboratory Hitachi Ltd.
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Nabatame Toshihide
Mirai Project Association Of Super-advanced Electronics Technology (aset)
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SHIMOGAKI Yukihiro
Department of Materials Engineering, The University of Tokyo
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Wang W
National Tainan Teachers Coll. Tainan Twn
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Wang Wenwu
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Shimogaki Yukihiro
Department Of Materials Engineering Faculty Of Engineering Univerity Of Tokyo
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Shimogaki Y
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Shimogaki Yukihiro
Univ. Tokyo Tokyo Jpn
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Shimogaki Yukihiro
Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo,
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SHIMOGAKI YUKIHIRO
Department of Chemical Engineering, University of Tokyo
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