Ruthenium Films Prepared by Liquid Source Metalorganic Chemical Vapor Deposition Using Ru(dpm)_3 Dissolved with Tetrahydrofuran Solvent : Surfaces, Interfaoes, and Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2002-03-15

著者

• Hiratani M

  Central Research Laboratory Hitachi Ltd.

• Hiratani M

  Central Research Laboratory Hitachi Ltd

• Hiratani Masahiko

  Central Research Laboratory Hitachi Ltd.

• Nabatame Toshihide

  Mirai-association Of Super-advanced Electronics Technologies (mirai-aset) National Institute Of Adva

• Nabatame T

  Aist Tsukuba Jpn

• Nabatame Toshihide

  Mirai-aset Advanced Industrial Science And Technology (aist)

• Nabatame Toshihide

  Hitachi Research Laboratory Hitachi Ltd.

• Suzuki T

  Hitachi Research Laboratory Hitachi Ltd.

• Suzuki T

  Nagaoka Univ. Technol.

• SUZUKI Takaaki

  Hitachi Research Laboratory of Hitachi Ltd.

• Suzuki Tatsuya

  Graduate School Of Engineering Yokohama National University

• KADOSHIMA Masaru

  Hitachi Research Laboratory, Hitachi Ltd.

• Kadoshima Masaru

  Hitachi Research Laboratory Hitachi Ltd.

• Nakamura Yoshitaka

  Device Center Elpida Memory Inc.

• ASANO Yoshitaka

  Device Center, Elpida Memory, Inc.

• Asano Yoshitaka

  Device Center Elpida Memory Inc.

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