Electron Cyclotron Resonance-Reactive Ion Etching of III-V Semiconductors by Cyclic Injection of CH_4/H_2/Ar and O_2 with Constant Ar Flow
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-30
著者
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羽路 伸夫
横浜国立大学大学院工学研究院
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Suzuki T
Nagaoka Univ. Technol.
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ARAKAWA Taro
Graduate School of Engineering, Yokohama National University
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HANEJI Nobuo
Graduate School of Engineering, Yokohama National University
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TADA Kunio
Graduate School of Engineering, Kanazawa Institute of Technology
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IDE Tomoyoshi
Graduate School of Engineering, Yokohama National University
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SHIMOGAKI Yukihiro
Graduate School of Engineering, The University of Tokyo
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SUZUKI TATSUYA
Graduate School of Engineering, Nagoya University
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SEGAMI Goh
Graduate School of Engineering, Yokohama National University
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NAKANO Yoshiaki
Graduate School of Engineering, University of Tokyo
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多田 邦雄
金沢工業大学大学院
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Ide Tomoyoshi
Graduate School Of Engineering Yokohama National University
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