Electronic State of Metalloporphyrins
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1988-01-20
著者
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Imamura K
Fujitsu Lab. Ltd. Kanagawa Jpn
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羽路 伸夫
横浜国立大学大学院工学研究院
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SUGAHARA Masanori
Faculty of Engineering, Yokohama National University
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HANEJI Nobuo
Faculty of Engineering, Yokohama National University
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KANEDA Hisayoshi
Faculty of Engineering, Yokohama National University
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Imamura Kimitake
Faculty Of Engineering Yokohama National University
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Kaneda Hisayoshi
Division Of Electrical And Computer Engineering Faculty Of Engineering Yokohama National University
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Kaneda Hisayoshi
Faculty Of Engineering Yokohama National University
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Sugahara Masanori
Faculty Of Engineering Yokohama National University
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Sugahara Masanori
Division Of Electrical And Computer Engineering Faculty Of Engineering Yokohama National University
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Niki K
California Inst. Technol. Ca
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Niki Katsumi
Faculty Of Engineering Yokohama National University
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Sugahara M
Division Of Electrical And Computer Engineering Faculty Of Engineering Yokohama National University
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TAKANO Wataru
Faculty of Engineering, Yokohama National University
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Takano Wataru
Faculty Of Engineering Yokohama National University
関連論文
- 液相堆積法によるSiO_2膜について
- New Optical Memory Structure Using Self-Assembled InAs Quantum Dots
- Stacked InAs Self-Assembled Quantum Dots on (001) GaAs Grown by Molecular Beam Epitaxy
- Stacked InAs Self-Assembled Quantum Dots on (001) GaAs Grown by Molecular Beam Epitaxy
- PECVDによる低誘電率層間絶縁膜用a-C:F膜の合成( : 低誘電率層間膜及び配線技術)
- Anomalous Effect in La_Sr_xCuO_4 of Doping Level x=1/4^n
- 五層非対称結合量子井戸の作製トレランスに関する理論検討(量子効果デバイス(光信号処理,LD,光増幅,変調等)と集積化技術,一般,材料デバイスサマーミーティング)
- 五層非対称結合量子井戸の作製トレランスに関する理論検討(量子効果デバイス(光信号処理,LD,光増幅,変調等)と集積化技術,一般,材料デバイスサマーミーティング)
- Electroabsorptive Properties of InGaAs/InAlAs Five-Layer Asymmetric Coupled Quantum Well (FACQW)
- Improved Etched Surface Morphology in Electron Cyclotron Resonance-Reactive Ion Etching of GaN by Cyclic Injection of CH_4/H_2/Ar and O_2 with Constant Ar Flow
- GaAs系5層非対称結合量子井戸(FACQW)における巨大な電界誘起屈折率変化と高性能光変調器への応用(量子効果型光デバイス・光集積化技術, 及び一般)
- 液相堆積シリコン酸化膜/シリコン界面特性の改善
- A Resonant-Tunneling Bipolar Transistor (RBT) : A New Functional Device with High Current Gain
- A New Functional, Resonant-Tunneling Hot Electron Transistor (RHET)
- A WSi/TiN/Au Gate Self-Aligned GaAs MESFET with Selectively Grown n^+-Layer using MOCVD
- Tunneling Hot Electron Transistor Using GaAs/AlGaAs Heterojunctions
- GaAs系5層非対称結合量子井戸(FACQW)における巨大な電界誘起屈折率変化と高性能光変調器への応用(量子効果型光デバイス・光集積化技術, 及び一般)
- Observation of Giant Electrorefractive Effect in Five-Layer Asymmetric Coupled Quantum Wells (FACQWs)
- Electron Cyclotron Resonance-Reactive Ion Etching of III-V Semiconductors by Cyclic Injection of CH_4/H_2/Ar and O_2 with Constant Ar Flow
- パルスレーザ蒸着(PLD)法による(Ba,Sr)TiO_3薄膜の作製における下部電極について(ゲート絶縁膜,容量膜,機能膜及びメモリ技術)
- パルスレーザ蒸着法によるPt上への(Ba,Sr)TiO_3薄膜の多段階成膜(物性,成膜,加工,プロセス : 強誘電体薄膜とデバイス応用)
- 強誘電体ゲートFETを用いたCMFS論理回路の検討(デバイス/回路動作 : 強誘電体薄膜とデバイス応用)
- Fabrication and Optical Characterization of Five-Layer Asymmetric Coupled Quantum Well (FACQW)
- Electron Cyclotron Resonance-Reactive Ion Beam Etching of InP by Cyclic Injection of CH_4/H_2/Ar and O_2(Semiconductors)
- 液相堆積法による低誘電率シリコン酸化膜
- Complementary Digital Logic Using Resistively Coupled Single-Electron Transistor
- Complementary Digital Logic Using Resistively Coupled Single Electron Transistor
- Dynamic Characteristics of Inverter Circuits Using Single Electrorn Transistors
- ゲート絶縁膜に液相堆積法によるSiO_2膜を用いたSiMOSダイオードの諸特性
- Experiment on Phase-Quantum-Tunneling Device
- Macroscopic Quantum Effect Conjugate to Josephson Effect
- 液相堆積法(Liquid Phase Deposition)によるSi-MOSダイオードのウエハー前処理について
- Discontinuity of Magnetic Flux Trapped in Multiply Connected Superconductor
- Field-Effect Induced Sinusoidal Conductivity Variation of NbN Granular Thin Film
- New Logic Circuit with DC Parametric Excitation
- Synthesis of (Ba,Sr)TiO_3 Thin Films by Plasma-Activated Pulsed Laser Deposition Technique
- Electronic State of Metalloporphyrins
- 電界を用いた増速液相堆積法SiO_2膜の諸特性
- Theoretical Study of Josephson Junction with Double Barriers
- Flux and Charge Quanta in Junctions and Macroscopic Quantum Effect
- Single Electron Transfer Logic Gate Family
- Study of the Physical Properties of High-Temperature Oxide Superconductors Based on Superfluidity Models
- Observation of Single-Electron Charging Effect in BiSrCaCuO Granular Thin Films
- Superconductive Granular Thin Film and Phase Quantum Tunnel Device
- Quantized Electrical Field Effect in Granular Superconductor Thin Films
- Single-Electron-Tunneling Effect in Nanoscale Granular Microbridges ( Quantum Dot Structures)
- Possibility of Superdielectric : A New Ordered Phase in Copper Oxide Compound with CuO_2 Layers
- Fabrication of Pd Nanostructures with Scanning Tunneling Microscope
- Structure-Parameter Dependence of Modality of Macroscopic Quantum Effect in Superconductor Junction (II) : Linked Junction
- High-Temperature Superconductivity and Normal-State Anomaly
- Possibility of Bose-Einstein Condensation of Excitons in Quasiparticle-Injected Superconductor
- Current-Induced Transition Characteristics of Superconductors in Longitudinal Magnetic Field
- Dynamics of High-Frequency AC Process in Superconductor
- Oscillation of Orderparameter in the Nonequilibrium Superconductivity Caused by Quasiparticle Injection
- Complementary Digital Logic Using Resistively Coupled Single-Electron Transistor
- Single-Electron-Tunneling Effect in Nanoscale Granular Microbridges
- Structure-Parameter Dependence of Modality of Macroscopic Quantum Effect in Superconductor Junction (I) —Tunnel-Type Junction—
- Single Electron Transfer Logic Gate Family