Electron Cyclotron Resonance-Reactive Ion Beam Etching of InP by Cyclic Injection of CH_4/H_2/Ar and O_2(Semiconductors)
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-01-15
著者
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羽路 伸夫
横浜国立大学大学院工学研究院
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Suzuki T
Hitachi Research Laboratory Hitachi Ltd.
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Suzuki T
Nagaoka Univ. Technol.
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HANEJI Nobuo
Graduate School of Engineering, Yokohama National University
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TADA Kunio
Graduate School of Engineering, Kanazawa Institute of Technology
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SHIMOGAKI Yukihiro
Graduate School of Engineering, The University of Tokyo
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SUZUKI TATSUYA
Graduate School of Engineering, Nagoya University
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NAKANO Yoshiaki
Graduate School of Engineering, University of Tokyo
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多田 邦雄
金沢工業大学大学院
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Suzuki Tatsuya
Graduate School Of Engineering Yokohama National University
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Nakano Yoshiaki
Research Center For Advanced Science And Technology Univ. Of Tokyo
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Nakano Yoshiaki
Graduate School Of Engineering The University Of Tokyo
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Nakano Y
Research Center For Advanced Science And Technology The University Of Tokyo
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Shimogaki Y
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Nakano Yoshiaki
Department Of Electrical Engineering And Information Systems The University Of Tokyo
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Takizawa Kuniharu
Broadcasting Science Resarch Laboratories Hnk(japan Broadcasting Corporation)
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Nakano Yukie
Research Center for Advanced Science and Technology, The University of Tokyo
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