Shimogaki Yukihiro | Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo,
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概要
- Shimogaki Yukihiroの詳細を見る
- 同名の論文著者
- Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo,の論文著者
関連著者
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Shimogaki Yukihiro
Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo,
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SHIMOGAKI YUKIHIRO
Department of Chemical Engineering, University of Tokyo
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Shimogaki Yukihiro
Department of Electronic Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113, Japan
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Shimogaki Yukihiro
Department Of Materials Engineering Faculty Of Engineering Univerity Of Tokyo
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SHIMOGAKI Yukihiro
Department of Materials Engineering, The University of Tokyo
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Shimogaki Y
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Komiyama Hiroshi
Department Of Chemical Engineering Faculty Of Engineering University Of Tokyo
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Sugiyama Masakazu
Department Of Biotechnology Graduate School Of Agriculture And Life Sciences The University Of Tokyo
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Komiyama H
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
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KOMIYAMA Hiroshi
Department of Chemical System Engineering, The University of Tokyo
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Nakano Yoshiaki
Department Of Electrical Engineering And Information Systems The University Of Tokyo
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SUGIYAMA Masakazu
Department of Electronic Engineering, School of Engineering, University of Tokyo
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Sugiyama Masaaki
R & D Laboratories-i Central R & D Bureau Nippon Steel Cotporation
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Sugiyama Masaaki
Advanced Materials & Technology Research Laboratories Nippon Steel Corporation
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Sugiyama M
Department Of Electric Engineering And Information Systems School Of Engineering The University Of T
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Sugiyama Munehiro
Ntt Interdisciplinary Research Laboratories
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Sugiyama M
Institute Of Engineering Innovation School Of Engineering The University Of Tokyo
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Nabatame Toshihide
Mirai Project Association Of Super-advanced Electronics Technology (aset)
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Wang Wenwu
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Tada Kunio
Department Of Electronic Engineering Faculty Of Engineering The University Of Tokyo
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Tada Kunio
Department of Electrical and Computer Engineering, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
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NAKANO Yoshiaki
Department of Surgery, NTT West Osaka Hospital
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Itoh Hisayoshi
Institute Of Materials Science University Of Tsukuba
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Itoh H
Semiconductor Academic Research Center
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Itoh Hitoshi
Semiconductor Academic Research Center
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Nakano Yoshiaki
Research Center For Advanced Science And Technology Univ. Of Tokyo
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Nakano Y
Research Center For Advanced Science And Technology The University Of Tokyo
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AOYAMA Jyun-ichi
Semiconductor Academic Research Center
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Nakano Yoshiaki
Department Of Surgery Ntt West Osaka Hospital
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Shimogaki Yukihiro
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Nakano Yukie
Research Center for Advanced Science and Technology, The University of Tokyo
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EGASHIRA Yasuyuki
Graduate School of Engineering Science, Osaka University
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Nabatame Toshihide
Mirai-association Of Super-advanced Electronics Technologies (mirai-aset) National Institute Of Adva
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Nabatame T
Aist Tsukuba Jpn
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Nabatame Toshihide
Mirai-aset Advanced Industrial Science And Technology (aist)
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Nabatame Toshihide
Hitachi Research Laboratory Hitachi Ltd.
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Haneji Nobuo
Division Of Electrical And Computer Engineering Faculty Of Engineering Yokohama National University
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TADA Kunio
Department of Electronic Engineering, The University of Tokyo
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Tada Kunio
Department Of Electronic Engineering Faculty Of Engineering University Of Tokyo
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Nakano Yoshiaki
Graduate School Of Engineering The University Of Tokyo
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Egashira Yasuyuki
Graduate School Of Engineering Science Osaka University
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Egashira Yasuyuki
Department Of Chemical Engineering Graduate School Of Engineering Science Osaka University
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Wang W
National Tainan Teachers Coll. Tainan Twn
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Nakano Takayuki
Department Of Biosciences Teikyo University
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Sugiyama Masakazu
Institute Of Engineering Innovation School Of Engineering The University Of Tokyo
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Nakano Yoshiaki
Research Center For Advanced Science And Technology (rcast) At The University Of Tokyo
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Shimogaki Yukihiro
Univ. Tokyo Tokyo Jpn
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Shimogaki Yukihiro
Department of Materials Engineering, School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Lim S
Advanced Products Res. And Dev. Lab. Tx Usa
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Lim Sang
Department Of Chemical System Engineering University Of Tokyo:(present Address)department Of Electri
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多田 邦雄
金沢工業大学大学院
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EGASHIRA Yasuyuki
Department of Chemical Engineering, Osaka University
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Yang Jung-seung
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Noda Suguru
Department Of Chemical System Engineering School Of Engineering The University Of Tokyo
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Deura Momoko
Department Of Electrical Engineering And Information Systems School Of Engineering The University Of
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Sodabanlu Hassanet
Department Of Electrical Engineering And Information System School Of Engineering The University Of
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Kim Hoon
Department Of Agricultural Chemistry Sunchon National University
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Takizawa Kuniharu
Broadcasting Science Resarch Laboratories Hnk(japan Broadcasting Corporation)
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Shimizu Hideharu
Taiyo-Nippon Sanso Corp., Tsukuba, Ibaraki 300-2611, Japan
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Momose Takeshi
Department of Material Engineering, The University of Tokyo, Bunkyo, Tokyo 163-8656, Japan
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Tsumura Takeshi
Department of Chemical System Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Shimogaki Yukihiro
Department of Materials Engineering, School of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Deura Momoko
Department of Applied Physics, Faculty of Science, Tokyo University of Science, Katsushika, Tokyo 125-8585, Japan
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Nagata Shoichi
Dep. Of Materials Sci. And Engineering Muroran Inst. Of Technol. 27-1 Mizumoto-cho Muroran Hokkaido
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Nagata Shoichi
Muroran Inst. Technol. Hokkaido Jpn
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TANAKA Takeo
Department of Medicine and Clinical Sciences, Yamaguchi University Graduate School of Medicine
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Nagata S
Osaka Univ.
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NAGATA Shinji
Institute for Chemical Research, Kyoto University
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OGAWA Hiroki
Department of Surgery, Otsu Red Cross Hospital
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Ogawa H
Univ. Tokyo Tokyo Jpn
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Haneji Nobuo
Division Of Electrical Engineering Yokohama National University
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Haneji Nobuo
Division Of Electrical And Computer Engineering Yokohama National University
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Kim Young
Department Of Agricultural Chemistry The University Of Tokyo
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Kim Y
Department Of Materials Engineering Faculty Of Engineering University Of Tokyo
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Nakajima T
Univ. Tokyo Tokyo
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Nakajima Tohru
Departments Of Pediatric Cardiology Osaka Medical Center And Research Institute For Maternal And Chi
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WATANABE Hiroki
Department of Applied Chemistry, Faculty of Engineering, Oita University
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YAMAGUCHI Sadae
Institute for Materials Research, Tohoku University
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Takahiro Katsumi
Institute for Materials Research, Tohoku University
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SATO Hiroshi
Technology Development Center, Tokyo Electron Ltd.
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Kojima Yasuhiko
Technology Development Center Tokyo Electron At Limited
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Nakajima Tohru
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
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Ogawa Hiroki
Department Of Material Science School Of Engineering University Of Tokyo
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Yamaguchi Sadaei
Institute For Materials Research Tohoku University
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Zhao Bin
Department Of Agricultural & Biological Engineering University Of Illinois At Urbana-champaign
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Sudo S
Nec Compound Semiconductor Devices Ltd. Shiga Jpn
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Jun Keeyoung
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Nagata S
Tohoku University
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Nasu Shoichi
Kanazawa Institute Of Technology
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SODABANLU Hassanet
Department of Electrical Engineering and Information System, School of Engineering, The University o
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SHIODA Tomonari
Department of Electrical Engineering and Information Systems, School of Engineering, the University
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SATO Yusuke
Corporate Research and Development Center, Toshiba Corp.
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HORIIKE Yasuhiko
Department of Metallurgy and Material Sciences, School of Engineering, University of Tokyo
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YAMASHITA Kohichi
Department of Chemical System Engineering, School of Engineering, University of Tokyo
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FERON Olivier
Department of Materials Science and Metallurgy, School of Engineering, University of Tokyo
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SUDO Sinya
Department of Electronic Engineering, School of Engineering, University of Tokyo
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Feron Olivier
Department Of Materials Science And Metallurgy School Of Engineering University Of Tokyo
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Takahiro K
Tohoku University
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Takahiro Katsumi
Institute For Materials Research Tohoku University
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Takahiro Katsumi
Department Of Electrical Engineering Hiroshima University
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IINO Tomohisa
Department of Materials Science and Metallurgy, School of Engineering, University of Tokyo
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SAITO Takeyasu
Department of Chemical Engineering, Faculty of Engineering, The University of Tokyo
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YUYAMA Yoshiaki
Hitachi VLSI Engineering Corp.
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SUGAWARA Katsuro
Hitachi VLSI Engineering Corp.
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Yoda Takashi
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
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TOKIMITSU Takumi
Department of Materials Engineering, The University of Tokyo
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SHIGA Jyunko
Division of Electrical Engineering, Yokohama National University
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Tanaka Takeo
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
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Takenaka Mitsuru
Department Of Electrical Engineering And Information Systems School Of Engineering The University Of
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Yamaguchi Sadae
Institute For Materials Research Tohoku University
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Shimogaki Yukihiro
Department Of Materials Engineering Faculty Of Engineering University Of Tokyo
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LIM SangWoo
Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo
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Tokimitsu Takumi
Department Of Materials Engineering The University Of Tokyo
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Saito Takeyasu
Department Of Chemical Engineering Faculty Of Engineering The University Of Tokyo
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Shiga Jyunko
Division Of Electrical Engineering Yokohama National University
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Kada Takeshi
Tri Chemical Laboratories Inc.
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Sudo Sinya
Department Of Electronic Engineering School Of Engineering University Of Tokyo
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FUJINO Katsuhiro
Semiconductor Process Laboratory
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Koseki Toshihiko
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Hamamura Hirotaka
Department Of Materials Engineering Faculty Of Engineering University Of Tokyo
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Hamamura Hirotaka
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
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Lim Sang
Department Of Chemical Engineering Sungkyunkwan University
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Ogawa Hiroki
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology:(present Address) N
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Kondo Yoshiyuki
Department Of Applied Chemistry And Bioengineering Graduate School Of Engineering Osaka City Univers
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Nakajima Tohru
Department Of Chemical System Engineering Graduate School Of Engineering University Of Tokyo
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Sugawara K
Hitachi Vlsi Engineering Corp.:(present Address)department Of Computer Science College Of Engineerin
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Takagi Shinichi
Department Of Electrical Engineering And Information Systems The University Of Tokyo
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Horiike Yasuhiko
Department Of Metallurgy And Material Sciences School Of Engineering University Of Tokyo
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Iino Tomohisa
Department Of Applied Biology And Chemistry Tokyo University Of Agriculture
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Iino Tomohisa
Department Of Materials Science And Metallurgy School Of Engineering University Of Tokyo
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Sato Yusuke
Corporate Research And Development Center Toshiba Corp.
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Yamashita Kohichi
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
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Lim Sang
Department Of Anesthesiology And Pain Medicine Korea University Guro Hospital
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Naito Yasushi
Department Of Otolaryngology Head And Neck Surgery Kobe City Medical Center General Hospital
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SODABANLU Hassanet
Research Center for Advanced Science and Technology, The University of Tokyo
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Nagano Shuji
Taiyo Nippon Sanso Corporation, 10 Okubo, Tsukuba, Ibaraki 300-2611, Japan
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Tajima Nobuo
National Institute for Material Science, Tsukuba, Ibaraki 305-0047, Japan
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Momose Takeshi
Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Ohba Takayuki
Division of University Corporate Relations, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8654, Japan
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Kajikawa Yuya
Department of Chemical System Engineering, School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Tsumura Takeshi
Department of Chemical System Engineering, School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Nabatame Toshihide
MIRAI-ASET, AIST, Tsukuba West 7, 16-1 Onogawa, Tsukuba, 305-8569, Japan
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Fukuhara Jota
Advanced Memory Product Development Department, Memory Division, Toshiba Corporation Semiconductor Company, 800, Yamanoisshiki-cho, Yokkaichi, Mie 512-8550, Japan
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Shimizu Hideharu
Taiyo-Nippon Sanso Corporation, Tsukuba, Ibaraki 300-2611, Japan
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Kojima Yasuhiko
Technology Development Center, Tokyo Electron AT Limited, 650 Mitsuzawa, Hosaka-cho, Nirasaki, Yamanashi 407-0192, Japan
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Lim Sangwoo
Department of Chemical and Biomolecular Engineering, Yonsei University, 134 Shinchon-dong, Seodaemoon-gu, Seoul 120-749, Korea
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Takagi Shinichi
Department of Electrical Engineering and Information Systems, School of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Komiyama Hiroshi
Department of Chemical System Engineering, School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Coldren Larry
Optoelectronics Technology Center, University of California, Santa Barbara, CA 93106, USA
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Koseki Toshihiko
Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Ohta Tomohiro
Division of University Corporate Relations, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8654, Japan
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Kim Hoon
Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Deura Momoko
Department of Electrical Engineering and Information Systems, School of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Deura Momoko
Department of Electronic Engineering, School of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Tada Kunio
Department of Electronic Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113, Japan
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Sugiyama Masakazu
Institute of Engineering Innovation, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Sugiyama Masakazu
Institute of Engineering Innovation, School of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Sugiyama Masakazu
Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo,
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Kondo Yoshiyuki
Department of Electrical Engineering and Information Systems, School of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Tajima Nobuo
National Institute for Materials Science, Tsukuba, Ibaraki 305-0047, Japan
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Jun Keeyoung
Department of Materials Engineering, School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Yamaizumi Takayuki
Department of Electronic Engineering, Faculty of Engineering, University of Tokyo,
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Nezuka Masahiro
Plasma System Corporation, 992 Yaho, Kunitachi-shi, Tokyo 186, Japan
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Zhao Bin
Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Naito Yasushi
Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Mondry Mark
Optoelectronics Technology Center, University of California, Santa Barbara, CA 93106, USA
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Onishi Hirofumi
Department of Electronic Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113, Japan
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Sudo Shinya
Department of Electronic Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113, Japan
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Kada Takeshi
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Kada Takeshi
Tri Chemical Laboratories Inc., Uenohara, Yamanashi 409-0112, Japan
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Shioda Tomonari
Department of Electronic Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Noda Suguru
Department of Chemical System Engineering, School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Sato Hiroshi
Technology Development Center, Tokyo Electron AT Limited, 650 Mitsuzawa, Hosaka-cho, Nirasaki, Yamanashi 407-0192, Japan
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Sato Hiroshi
Technology Development Center, Tokyo Electron AT Limited
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Shimogaki Yukihiro
Department of Materials Engineering, The University of Tokyo, Bunkyo, Tokyo 163-8656, Japan
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Sakoda Kaoru
Taiyo-Nippon Sanso Corporation, Tsukuba, Ibaraki 300-2611, Japan
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Haneji Nobuo
Division of Electrical and Computer Engineering, Yokohama National University, 79-1 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
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Nabatame Toshihide
MIRAI-ASET, AIST, Tsukuba West 7, 16-1 Onogawa, Tsukuba 305-8569, Japan
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Yang Jung-Seung
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
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Wang Wenwu
Department of Materials Engineering, School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Sodabanlu Hassanet
Department of Electrical Engineering and Information System, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
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Nakano Takayuki
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Ogawa Hiroki
Department of Chemistry, School of Science and Engineering, Waseda University
著作論文
- Intersubband Transition at 1.52μm in GaN/AlN Multiple Quantum Wells Grown by Metal Organic Vapor Phase Epitaxy
- Examination of Surface Elementary Reaction Model for Chemical Vapor Deposition of Al Using In Situ Infrared Reflection Absorption Spectroscopy : Teoretical Optimization Procedure (3)
- Elementary Surface Reaction Simulation of Aluminum Chemical Vapor Deposition from Dimethylaluminumhydride Based on Ab Initio Calculations : Theoretical Process Optimization Procedure(2)
- Kinetics of GaAs Metalorganic Chemical Vapor Deposition Studied by Numerical Analysis Based on Experimental Reaction Data
- Reaction Analysis of Aluminum Chemical Vapor Deposition from Dimethyl-aluminum-hydride Using Tubular Reactor and Fourier-Transform Infrared Spectroscopy : Theoretical Process Optimization Procedure(1)
- Effect of Underlayers on the Morphology and Orientation of Aluminum Films Prepared by Chemical Vapor Deposition Using Dimethylaluminumhydride
- Deposition of wsi_x Films from Preactivated Mixture of WF_6/SiH_4
- Electrical and Thermal Stability Characteristics of HfCN Films as Metal Gate-Electrode Synthesized by Metalorganic Chemical Vapor Deposition
- Physical and Electrical Characteristics of HfN Metal Gate Electrode Synthesized by Post-Rapid Thermal Annealing-assisted MOCVD
- Fabrication of Hf(C)N Films on SiO_2 by Metal Organic Chemical Vapor Deposition (MOCVD) Using TDEAHf Precursor
- Preparation of Amorphous Fluorinated Carbon Film Using Low Global-Warming Potential Gas, C_4F_6, by Plasma Enhanced Chemical Vapor Deposition
- Novel Precursors for SiCH Low-$k$ Caps beyond the 22 nm Node: Reactions of Silacyclopentane Precursors in the Plasma-Enhanced Chemical Vapor Deposition Process and Structural Analyses of SiCH Films
- Decrease in Deposition Rate and Improvement of Step Coverage by CF_4 Addition to Plasma-Enhanced Chemical Vapor Deposition of Silicon Oxide Films
- Preparation of Low Dielectric Constant F-Doped SiO_2 Films by PECVD
- High-Temperature Annealing Effect of Si in Group-V Ambient Prior to Heteroepitaxy of InAs in Metal--Organic Vapor Phase Epitaxy
- Step Coverage Analysis for Hexamethyldisiloxane and Ozone Atmospheric Pressure Chemical Vapor Deposition
- Adhesion Characteristics between Chemical Vapor Deposited Cu and TiN Films : Aspects of Process Integration
- Stranski–Krastanov Growth of Tungsten during Chemical Vapor Deposition Revealed by Micro-Auger Electron Spectroscopy
- Nucleation of W during Chemical Vapor Deposition from WF6 and SiH4
- Kinetics of Subsurface Formation during Metal–Organic Vapor Phase Epitaxy Growth of InP and InGaP
- Atomic Layer Deposited Co(W) Film as a Single-Layered Barrier/Liner for Next-Generation Cu-Interconnects
- Material Consideration on Ta, Mo, Ru, and Os as Glue Layer for Ultra Large Scale Integration Cu Interconnects
- Kinetic Analysis of Surface Adsorption Layer in GaAs(001) Metalorganic Vapor Phase Epitaxy by In situ Reflectance Anisotropy Spectroscopy
- In situ Observation of Initial Nucleation and Growth Processes in Supercritical Fluid Deposition of Copper
- Effect of Partial Pressure of TiCl4 and NH3 on Chemical Vapor Deposition Titanium Nitride (CVD-TiN) Film Cl Content and Electrical Resistivity
- Simple Kinetic Model of ECR Reactive Ion Beam Etching Reactor for the Optimization of GaAs Etching Process
- Effects of Ag Addition on the Resistivity, Texture and Surface Morphology of Cu Metallization
- Impurity-free Disordering of InGaAs/InGaAlAs Quantum Wells on InP by Dielectric Thin Cap Films and Characterization of Its In-plane Spatial Resolution
- Competitive Kinetics Model to Explain Surface Segregation of Indium during InGaP Growth by Using Metal Organic Vapor Phase Epitaxy
- Fabrication of Hf(C)N Films on SiO2 by Metal Organic Chemical Vapor Deposition (MOCVD) Using TDEAHf Precursor
- Electrical and Thermal Stability Characteristics of HfCN Films as Metal Gate-Electrode Synthesized by Metalorganic Chemical Vapor Deposition
- Intersubband Transition at 1.52 μm in GaN/AlN Multiple Quantum Wells Grown by Metal Organic Vapor Phase Epitaxy