AOYAMA Jyun-ichi | Semiconductor Academic Research Center
スポンサーリンク
概要
関連著者
-
Itoh Hisayoshi
Institute Of Materials Science University Of Tsukuba
-
Itoh H
Semiconductor Academic Research Center
-
SHIMOGAKI Yukihiro
Department of Materials Engineering, The University of Tokyo
-
SUGIYAMA Masakazu
Department of Electronic Engineering, School of Engineering, University of Tokyo
-
Itoh Hitoshi
Semiconductor Academic Research Center
-
Sugiyama Masaaki
R & D Laboratories-i Central R & D Bureau Nippon Steel Cotporation
-
Sugiyama Masaaki
Advanced Materials & Technology Research Laboratories Nippon Steel Corporation
-
Sugiyama M
Department Of Electric Engineering And Information Systems School Of Engineering The University Of T
-
Sugiyama Munehiro
Ntt Interdisciplinary Research Laboratories
-
KOMIYAMA Hiroshi
Department of Chemical System Engineering, The University of Tokyo
-
AOYAMA Jyun-ichi
Semiconductor Academic Research Center
-
Sugiyama M
Institute Of Engineering Innovation School Of Engineering The University Of Tokyo
-
Shimogaki Yukihiro
Department Of Materials Engineering Faculty Of Engineering Univerity Of Tokyo
-
Sugiyama Masakazu
Department Of Biotechnology Graduate School Of Agriculture And Life Sciences The University Of Tokyo
-
Komiyama H
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
-
Komiyama Hiroshi
Department Of Chemical Engineering Faculty Of Engineering University Of Tokyo
-
Shimogaki Y
Department Of Materials Engineering School Of Engineering The University Of Tokyo
-
Shimogaki Yukihiro
Department of Electronic Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113, Japan
-
Shimogaki Yukihiro
Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo,
-
SHIMOGAKI YUKIHIRO
Department of Chemical Engineering, University of Tokyo
-
EGASHIRA Yasuyuki
Graduate School of Engineering Science, Osaka University
-
TANAKA Takeo
Department of Medicine and Clinical Sciences, Yamaguchi University Graduate School of Medicine
-
OGAWA Hiroki
Department of Surgery, Otsu Red Cross Hospital
-
Ogawa H
Univ. Tokyo Tokyo Jpn
-
Nakajima T
Univ. Tokyo Tokyo
-
Nakajima Tohru
Departments Of Pediatric Cardiology Osaka Medical Center And Research Institute For Maternal And Chi
-
Nakajima Tohru
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
-
EGASHIRA Yasuyuki
Department of Chemical Engineering, Osaka University
-
Ogawa Hiroki
Department Of Material Science School Of Engineering University Of Tokyo
-
Egashira Yasuyuki
Graduate School Of Engineering Science Osaka University
-
Egashira Yasuyuki
Department Of Chemical Engineering Graduate School Of Engineering Science Osaka University
-
SATO Yusuke
Corporate Research and Development Center, Toshiba Corp.
-
HORIIKE Yasuhiko
Department of Metallurgy and Material Sciences, School of Engineering, University of Tokyo
-
YAMASHITA Kohichi
Department of Chemical System Engineering, School of Engineering, University of Tokyo
-
IINO Tomohisa
Department of Materials Science and Metallurgy, School of Engineering, University of Tokyo
-
Tanaka Takeo
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
-
Ogawa Hiroki
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology:(present Address) N
-
Nakajima Tohru
Department Of Chemical System Engineering Graduate School Of Engineering University Of Tokyo
-
Horiike Yasuhiko
Department Of Metallurgy And Material Sciences School Of Engineering University Of Tokyo
-
Iino Tomohisa
Department Of Applied Biology And Chemistry Tokyo University Of Agriculture
-
Iino Tomohisa
Department Of Materials Science And Metallurgy School Of Engineering University Of Tokyo
-
Sato Yusuke
Corporate Research And Development Center Toshiba Corp.
-
Yamashita Kohichi
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
-
Ogawa Hiroki
Department of Chemistry, School of Science and Engineering, Waseda University
著作論文
- Examination of Surface Elementary Reaction Model for Chemical Vapor Deposition of Al Using In Situ Infrared Reflection Absorption Spectroscopy : Teoretical Optimization Procedure (3)
- Elementary Surface Reaction Simulation of Aluminum Chemical Vapor Deposition from Dimethylaluminumhydride Based on Ab Initio Calculations : Theoretical Process Optimization Procedure(2)
- Reaction Analysis of Aluminum Chemical Vapor Deposition from Dimethyl-aluminum-hydride Using Tubular Reactor and Fourier-Transform Infrared Spectroscopy : Theoretical Process Optimization Procedure(1)
- Effect of Underlayers on the Morphology and Orientation of Aluminum Films Prepared by Chemical Vapor Deposition Using Dimethylaluminumhydride