Preparation of Amorphous Fluorinated Carbon Film Using Low Global-Warming Potential Gas, C_4F_6, by Plasma Enhanced Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 2006-02-25
著者
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Haneji Nobuo
Division Of Electrical And Computer Engineering Faculty Of Engineering Yokohama National University
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Haneji Nobuo
Division Of Electrical Engineering Yokohama National University
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WATANABE Hiroki
Department of Applied Chemistry, Faculty of Engineering, Oita University
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SHIMOGAKI Yukihiro
Department of Materials Engineering, The University of Tokyo
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TOKIMITSU Takumi
Department of Materials Engineering, The University of Tokyo
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SHIGA Jyunko
Division of Electrical Engineering, Yokohama National University
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Shimogaki Yukihiro
Department Of Materials Engineering Faculty Of Engineering Univerity Of Tokyo
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Tokimitsu Takumi
Department Of Materials Engineering The University Of Tokyo
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Shiga Jyunko
Division Of Electrical Engineering Yokohama National University
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Shimogaki Yukihiro
Department of Electronic Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113, Japan
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Shimogaki Yukihiro
Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo,
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SHIMOGAKI YUKIHIRO
Department of Chemical Engineering, University of Tokyo
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